Measurement of the electrical resistivity and Hall coefficient at high temperatures

Review of Scientific Instruments

Volumn 83, Issue 12, 2012, Pages

  Borup, Kasper A ^a   Toberer, Eric S ^b   Zoltan, Leslie D ^c   Nakatsukasa, George ^c   Errico, Michael ^c   Fleurial, Jean Pierre ^c   Iversen, Bo B ^a   Snyder, G Jeffrey ^d  

^a AARHUS UNIVERSITY   (Denmark)

^b Department of Geology and Geological Engineering   (United States)

^c CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^d California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL RESISTIVITY; HALL COEFFICIENT; HEAVILY DOPED; HIGH TEMPERATURE; HIGH TEMPERATURE MEASUREMENT; SAMPLE GEOMETRY; THERMOELECTRICS; VAN DER PAUW;

TEMPERATURE MEASUREMENT;

ELECTRIC CONDUCTIVITY;

EID: 84874884101     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4770124     Document Type: Article

References (28)

1. V. I., Fistul, Heavily Doped Semiconductors (Plenum, New York, 1969).
2. L. J., van der Pauw, Philips Res. Rep., 13, 1 (1958).
3. C., Wood, A., Lockwood, A., Chmielewski, J., Parker, and A., Zoltan, Rev. Sci. Instrum., 55, 110 (1984). 10.1063/1.1137581
4. J. A., McCormac and J.-P., Fleurial, in, Modern Perspectives on Thermoelectrics and Related Materials Symposium (Materials Research Society, Anaheim, CA, 1991), p. 135.
5. M., Morvic, in, Proceedings of the Modern Perspectives on Thermoelectrics and Related Materials Symposium, Smolenice Castle, Slovakia, 2000 (IEEE, 2000), p. 327.
6. T. M., Dauphinee and E., Mooser, Rev. Sci. Instrum., 26, 660 (1955). 10.1063/1.1715281
7. C. M., Hurd, J. Sci. Instrum., 42, 465 (1965). 10.1088/0950-7671/42/7/304
8. D. M., Rowe and R. W., Bunce, J. Phys. E, 4, 902 (1971). 10.1088/0022-3735/4/11/027
9. G. L., Guthrie, Rev. Sci. Instrum., 36, 1177 (1965). 10.1063/1.1719833
10. J. M., Lavine, Rev. Sci. Instrum., 29, 970 (1958). 10.1063/1.1716070
11. E. E., Olson and J. E., Wertz, Rev. Sci. Instrum., 41, 419 (1970). 10.1063/1.1684532
12. E. M., Pell and R. L., Sproull, Rev. Sci. Instrum., 23, 548 (1952). 10.1063/1.1746081
13. T., Kaneda, S., Kobayash, and K., Shimoda, Jpn. J. Appl. Phys., 12, 1335 (1973). 10.1143/jjap.12.1335
14. N. Z., Lupu, N. M., Tallan, and D. S., Tannhaus, Rev. Sci. Instrum., 38, 1658 (1967). 10.1063/1.1720631
15. B. R., Russell and C., Wahlig, Rev. Sci. Instrum., 21, 1028 (1950). 10.1063/1.1745493
16. L. J., van der Pauw, Philips Tech. Rev., 20, 220 (1958).
17. C., Kasl and M. J. R., Hoch, Rev. Sci. Instrum., 76, 033907 (2005). 10.1063/1.1866232
18. D. W., Koon and C. J., Knickerbocker, Rev. Sci. Instrum., 63, 207 (1992). 10.1063/1.1142958
19. E. H., Putley, The Hall Effect and Related Phenomena (Butterworths, London, 1960).
20. C. J., Vineis, T. C., Harman, S. D., Calawa, M. P., Walsh, R. E., Reeder, R., Singh, and A., Shakouri, Phys. Rev. B, 77, 235202 (2008). 10.1103/PhysRevB.77.235202
21. D. W., Koon and C. J., Knickerbocker, Rev. Sci. Instrum., 64, 510 (1993). 10.1063/1.1144224
22. G. J., Snyder and E. S., Toberer, Nature Mater., 7, 105 (2008). 10.1038/nmat2090
23. H., Wang, Y., Pei, A. D., LaLonde, and G. J., Snyder, Proc. Natl. Acad. Sci. U.S.A., 109, 9705 (2012). 10.1073/pnas.1111419109
24. A., Zevalkink, W., Zeier, G., Pomrehn, E., Schechtel, W., Tremel, and G. J., Snyder, Energy Environ. Sci., 5, 9121 (2012). 10.1039/C2EE22378C
25. L. P., Hu, X. H., Liu, H. H., Xie, J. J., Shen, T. J., Zhu, and X. B., Zhao, Acta Mater., 60, 4431 (2012). 10.1016/j.actamat.2012.05.008
26. C. B., Vining, A., Zoltan, and J. W., Vandersande, Int. J. Thermophys., 10, 259 (1989). 10.1007/bf00500724
27. C., Wood, D., Zoltan, and G., Stapfer, Rev. Sci. Instrum., 56, 719 (1985). 10.1063/1.1138213
28. S., Iwanaga, E. S., Toberer, A., LaLonde, and G. J., Snyder, Rev. Sci. Instrum., 82, 063905 (2011). 10.1063/1.3601358