Extraordinary anisotropy of ultrafast laser writing in glass

Optics Express

Volumn 21, Issue 4, 2013, Pages 3959-3968

  Gecevǐius, Mindaugas ^a   Beresna, Martynas ^a   Zhang, Jingyu ^a   Yang, Weijia ^a   Takebe, Hiromichi ^b   Kazansky, Peter G ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^b EHIME UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; GLASS; SILICA; ULTRASHORT PULSES;

CHALCOGENIDE GLASS; DIFFERENT MECHANISMS; FEMTOSECOND LASER WRITING; PULSE-FRONT TILT; RASTER SCANNING; SCANNING GEOMETRY; SPATIO-TEMPORAL; STRESS-INDUCED; TRANSPARENT MATERIAL; ULTRA-SHORT LIGHT PULSE;

ULTRAFAST LASERS;

GLASS;

ANISOTROPY; CHEMISTRY; LASER; RADIATION RESPONSE; SURFACE PROPERTY; ARTICLE; RADIATION EXPOSURE;

ANISOTROPY; GLASS; LASERS; SURFACE PROPERTIES;

EID: 84874533022     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.003959     Document Type: Article

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