Surfactant-mediated control of colloid pattern assembly and attachment strength in evaporating droplets

Langmuir

Volumn 29, Issue 6, 2013, Pages 1831-1840

  Morales, Verónica L ^a,b   Parlange, Jean Yves ^b   Wu, Mingming ^a,c   Pérez Reche, Francisco J ^d   Zhang, Wei ^e   Sang, Wenjing ^b   Steenhuis, Tammo S ^b  

^a UNIVERSITY OF ABERTAY DUNDEE   (United Kingdom)

^b Department of Biological and Environmental Engineering   (United States)

^c School of Operations Research and Industrial Engineering   (United States)

^d UNIVERSITY OF ABERDEEN   (United Kingdom)

^e MICHIGAN STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABRUPT TRANSITION; ADSORPTION OF MICELLES; ATTACHMENT FORCES; ATTRACTIVE INTERACTIONS; CLOSE PROXIMITY; COLLOID PATTERNS; CONCENTRIC RINGS; CONTACT LINES; CONTACT-LINE DYNAMICS; DENSE LAYER; DEPOSITION PATTERNS; ELECTRIC DOUBLE LAYER; MECHANICAL INSTABILITIES; NONIONIC SOLUTES; PATTERN FORMATION; PHYSICAL BARRIERS; SESSILE DROPLET; SMOOTH SUBSTRATES; SOLID SUBSTRATES; SUBSTRATE SURFACE; SURFACTANT CONCENTRATIONS; THEORETICAL RESULT; VAN DER WAALS; VAN DER WAALS ATTRACTION;

DROPS; EVAPORATION; LIQUID FILMS; MICELLES; PHASE TRANSITIONS; SUBSTRATES; SURFACE TENSION; VAN DER WAALS FORCES;

SURFACE ACTIVE AGENTS;

EID: 84873662651     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la304685b     Document Type: Article

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