High aspect ratio gratings for X-ray phase contrast imaging

AIP Conference Proceedings

Volumn 1466, Issue , 2012, Pages 41-50

  Mohr, Jürgen ^a   Grund, Thomas ^a   Kunka, Danays ^a   Kenntner, Johannes ^a   Leuthold, Juerg ^a   Meiser, Jan ^a   Schulz, Joachim ^b   Walter, Marco ^b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b MICROWORKS GMBH   (Germany)

Author keywords

Differential phase contrast imaging; visibility; X ray grating; X ray lithography

Indexed keywords

EID: 84873249298     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.4742267     Document Type: Conference Paper

References (11)

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11. The mr-x resist is commercialized by micro resist technology, Berlin, Germany and has been developed through funding of the German Ministry of Education and Research within the INNOLIGA-Project under contract 16SV3522; many details can be found in: S. Lemke, Charakterisierung modizierter Negativresiste für die Röntgentiefenlithographie, Thesis, Technical University Berlin (2011)