Electrical control of magnetic reversal processes in magnetostrictive structures

Applied Physics Letters

Volumn 102, Issue 3, 2013, Pages

  Cavill, S A ^a   Parkes, D E ^b   Miguel, J ^a,c   Dhesi, S S ^a   Edmonds, K W ^b   Campion, R P ^b   Rushforth, A W ^b  

^a DIAMOND LIGHT SOURCE LTD   (United Kingdom)

^b UNIVERSITY OF NOTTINGHAM   (United Kingdom)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; CLOSURE-DOMAIN; ELECTRICAL CONTROL; EXTERNAL MAGNETIC FIELD; MAGNETIC REVERSAL PROCESS; MAGNETOCRYSTALLINE ANISOTROPY ENERGIES; MICRON SCALE;

MAGNETIC MATERIALS; MAGNETOCRYSTALLINE ANISOTROPY; MAGNETOSTRICTIVE DEVICES; TRANSDUCERS;

MAGNETIC DOMAINS;

EID: 84872941397     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4789396     Document Type: Article

References (23)

1. W. J. Gallagher and S. S. P. Parkin, IBM J. Res. Dev. 50 (1), 5 (2006); 10.1147/rd.501.0005
2. J. Z. Sun, IBM J. Res. Dev. 50 (1), 80 (2006). 10.1147/rd.501.0081
3. Parkin, U.S. patent 6,834,005 (1980);
4. Parkin, Science 320, 190 (2008). 10.1126/science.1145799
5. D. E. Parkes, S. A. Cavill, A. T. Hindmarch, P. Wadley, F. McGee, C. R. Staddon, K. W. Edmonds, R. P. Campion, B. L. Gallagher, and A. W. Rushforth, Appl. Phys. Lett. 101, 072402 (2012). 10.1063/1.4745789
6. A. W. Rushforth, E. De Ranieri, J. Zemen, J. Wunderlich, K. W. Edmonds, C. S. King, E. Ahmad, R. P. Campion, C. T. Foxon, B. L. Gallagher, K. Výborný, J. Kučera, and T. Jungwirth, Phys. Rev. B 78, 085314 (2008). 10.1103/PhysRevB.78.085314
7. M. Weiler, A. Brandlmaier, S. Geprägs, M. Althammer, M. Opel, C. Bihler, H. Huebl, M. S. Brandt, R. Gross, and S. T. B. Goennenwein, New J. Phys. 11, 013021 (2009). 10.1088/1367-2630/11/1/013021
8. M. Overby, A. Chernyshov, L. P. Rokhinson, X. Liu, and J. K. Furdyna, Appl. Phys. Lett. 92, 192501 (2008). 10.1063/1.2917481
9. H. Boukari, C. Cavaco, W. Eyckmans, L. Lagae, and G. Borghs, J. Appl. Phys. 101, 054903 (2007). 10.1063/1.2435818
10. J.-W. Lee, S.-C. Shin, and S.-K. Kim, Appl. Phys. Lett. 82, 2458 (2003). 10.1063/1.1566795
11. J. L. Hockel, A. Bur, T. Wu, K. P. Wetzlar, and G. P. Carman, Appl. Phys. Lett. 100, 022401 (2012). 10.1063/1.3675458
12. J.-M. Hu, Z. Li, L.-Q. Chen, and C.-W. Nan, Nat. Commun. 2, 553 (2011). 10.1038/ncomms1564
13. A. E. Clark, K. B. Hathaway, M. Wun-Fogle, J. B. Restorff, T. A. Lograsso, V. M. Keppens, G. Petculescu, and R. A. Taylor, J. Appl. Phys. 93, 8621 (2003). 10.1063/1.1540130
14. D. A. Allwood, G. Xiong, C. C. Faulkner, D. Atkinson, D. Petit, and R. P. Cowburn, Science 309, 1688 (2005). 10.1126/science.1108813
15. T. H. E. Lahtinen, J. O. Tuomi, and S. van Dijken, Adv. Mater. 23, 3187 (2011). 10.1002/adma.201100426
16. Y.-H. Chu, L. W. Martin, M. B. Holcomb, M. Gajek, S.-J. Han, Q. He, N. Balke, C.-H. Yang, D. Lee, W. Hu, Q. Zhan, P.-L. Yang, A. Fraile-Rodriguez, A. Scholl, S. X. Wang, and R. Ramesh, Nat. Mater. 7, 478 (2008). 10.1038/nmat2184
17. T. H. E. Lahtinen, K. J. A. Franke, and S. van Dijken, Sci. Rep. 2, 258 (2012). 10.1038/srep00258
18. C.-J. Hsu, J. L. Hockel, and G. P. Carman, Appl. Phys. Lett. 100, 092902 (2012). 10.1063/1.3690953
19. U. Ruediger, J. Yu, S. Zhang, A. D. Kent, and S. S. P. Parkin, Phys. Rev. Lett. 80, 5639 (1998). 10.1103/PhysRevLett.80.5639
20. J. McCord, J. Appl. Phys. 95, 6855 (2004). 10.1063/1.1667833
21. M. Dumm, M. Zölfl, R. Moosbühler, M. Brockmann, T. Schmidt, and G. Bayreuther, J. Appl. Phys. 87, 5457 (2000). 10.1063/1.373371
22. M. Donahue and D. G. Porter, " Interagency report NISTIR 6376.," OOMMF User's Guide, Version 1.0 (National Institute of Standards and Technology, Gaithersburg, MD, 1999).
23. P. E. Roy and J. Wunderlich, Appl. Phys. Lett. 99, 122504 (2011). 10.1063/1.3641884