Synthesis of dual-functional copolymer with orthogonally photosensitive groups

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 51, Issue 5, 2013, Pages 1215-1222

  Xu, Lebo ^a   Farrell, John ^a   Karunakaran, Raghuraman G ^a   Honglawan, Apiradee ^a   Yang, Shu ^a  

^a UNIVERSITY OF PENNSYLVANIA   (United States)

Author keywords

copolymerization; crosslinking; lithography; photochemistry; surfaces; thin films

Indexed keywords

COPOLYMERIZATION; CROSSLINKING; LITHOGRAPHY; PHOTOCHEMICAL REACTIONS; POLYMER FILMS; SEMICONDUCTING FILMS; SILICON COMPOUNDS; SILICON WAFERS; SURFACES; THIN FILMS;

FOURIER TRANSFORM INFRARED SPECTRA; FUNCTIONAL COPOLYMERS; OPTICAL QUALITIES; PHOTO-DECOMPOSITION; PHOTOACID GENERATORS; PHOTOSENSITIVE GROUPS; RADICAL COPOLYMERIZATION; T-BUTYL METHACRYLATE;

WETTING;

EID: 84872919089     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.26490     Document Type: Article

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