A microscopic study of strongly plasmonic Au and Ag island thin films

Journal of Applied Physics

Volumn 113, Issue 3, 2013, Pages

  Pavaskar, Prathamesh ^a   Hsu, I Kai ^a   Theiss, Jesse ^a   Hung, Wei Hsuan ^b   Cronin, Stephen B ^a  

^a University of Southern California   (United States)

^b FENG CHIA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD DISTRIBUTIONS; ELECTRIC FIELD INTENSITIES; ELECTRIC FIELD STRENGTH; ELECTROMAGNETIC RESPONSE; ENHANCEMENT FACTOR; EVAPORATED FILMS; ISLAND FILMS; METAL ISLAND FILMS; MICROSCOPIC STUDY; NANO-GAP; NEAR-FIELD COUPLING; PHOTO-CATALYTIC; PHOTOVOLTAIC; PLASMONIC; PLASMONIC RESPONSE; SEMI-CONTINUOUS; SERS ENHANCEMENT; SMALL GAPS; SURFACE ENHANCED RAMAN SCATTERING (SERS); TIO;

ELECTRIC FIELDS; ELECTROMAGNETIC WAVE ABSORPTION; FINITE DIFFERENCE TIME DOMAIN METHOD; GOLD; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; PHOTOCATALYSIS; PLASMONS; RAMAN SPECTROSCOPY; SURFACE SCATTERING; THIN FILMS; TITANIUM DIOXIDE;

SILVER;

EID: 84872835372     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4775784     Document Type: Article

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