Large-area fabrication of high aspect ratio tantalum photonic crystals for high-temperature selective emitters

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 31, Issue 1, 2013, Pages

  Rinnerbauer, Veronika ^a   Ndao, Sidy ^a   Yeng, Yi Xiang ^a   Senkevich, Jay J ^a   Jensen, Klavs F ^a   Joannopoulos, John D ^a   Soljačić, Marin ^a   Celanovic, Ivan ^a   Geil, Robert D ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b UNIVERSITY OF NORTH CAROLINA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTROMAGNETIC WAVE EMISSION; ENERGY CONVERSION; FABRICATION; SULFUR HEXAFLUORIDE; TANTALUM;

BOSCH PROCESS; CUTOFF WAVELENGTHS; DEEP CAVITY; DEEP REACTIVE ION ETCH; FABRICATION ROUTES; HIGH ASPECT RATIO; HIGH EMISSIVITY; HIGH TEMPERATURE; INTERFERENCE LITHOGRAPHY; PHOTONIC CRYSTAL FABRICATION; POLYCRYSTALLINE TA; SELECTIVE EMITTERS; SPECTRAL SELECTIVITY; THERMAL EMITTER; THERMOPHOTOVOLTAIC ENERGIES;

PHOTONIC CRYSTALS;

EID: 84872713673     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4771901     Document Type: Article

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