SCOPUS 정보 검색 플랫폼

Volumn 24, Issue 5, 2013, Pages

Discharge time dependence of a solution plasma process for colloidal copper nanoparticle synthesis and particle characteristics

(3) Pootawang, Panuphong a Saito, Nagahiro a Lee, Sang Yul b

a NAGOYA UNIVERSITY (Japan)

b Hankuk Aviation University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC PARTICLES; ASCORBIC ACIDS; CAPPING AGENT; COPPER NANOPARTICLES; CU-BASED; DISCHARGE TIME; HIGH VOLTAGE POWER SUPPLY; MATERIAL ENGINEERING; PARTICLE CHARACTERISTICS; PLASMA PROCESS; SIDE REACTIONS; SIZE AND SHAPE; SYNTHETIC ROUTES;

AMIDES; ANISOTROPY; COALESCENCE; METAL NANOPARTICLES; ORGANIC ACIDS; OXIDATION; PLASMAS; SYNTHESIS (CHEMICAL);

ELECTRIC DISCHARGES;

EID: 84872703566 PISSN: 09574484 EISSN: 13616528 Source Type: Journal
DOI: 10.1088/0957-4484/24/5/055604 Document Type: Article

Times cited : (52)

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