-
1
-
-
65449173197
-
-
APPLAB 0003-6951,. 10.1063/1.3122148
-
Y. Sakiyama, T. Tomai, M. Miyano, and D. B. Graves, Appl. Phys. Lett. APPLAB 0003-6951 94, 161501 (2009). 10.1063/1.3122148
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 161501
-
-
Sakiyama, Y.1
Tomai, T.2
Miyano, M.3
Graves, D.B.4
-
2
-
-
0346991669
-
-
JPAPBE 0022-3727,. 10.1088/0022-3727/36/23/007
-
E. Stoffels, I. E. Kieft, and R. E. J. Sladek, J. Phys. D JPAPBE 0022-3727 36, 2908 (2003). 10.1088/0022-3727/36/23/007
-
(2003)
J. Phys. D
, vol.36
, pp. 2908
-
-
Stoffels, E.1
Kieft, I.E.2
Sladek, R.E.J.3
-
3
-
-
54149093734
-
-
PPPLA6 1612-8850,. 10.1002/ppa200700154
-
G. Fridman, G. Friedman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, and A. Fridman, Plasma Processes Polym. PPPLA6 1612-8850 5, 503 (2008). 10.1002/ppap.200700154
-
(2008)
Plasma Processes Polym.
, vol.5
, pp. 503
-
-
Fridman, G.1
Friedman, G.2
Gutsol, A.3
Shekhter, A.B.4
Vasilets, V.N.5
Fridman, A.6
-
4
-
-
45749102465
-
-
APPLAB 0003-6951,. 10.1063/1.2940325
-
J. F. Kolb, A.- A H. Mohamed, R. O. Price, R. J. Swanson, A. Bowman, R. L. Chiavarini, M. Stacey, and K. H. Schoenbach, Appl. Phys. Lett. APPLAB 0003-6951 92, 241501 (2008). 10.1063/1.2940325
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 241501
-
-
Kolb, J.F.1
Mohamed, A.-A.H.2
Price, R.O.3
Swanson, R.J.4
Bowman, A.5
Chiavarini, R.L.6
Stacey, M.7
Schoenbach, K.H.8
-
5
-
-
54049153658
-
-
ACIEF5 1433-7851,. 10.1002/anie.200802891
-
D. Staack, A. Fridman, A. Gutsol, Y. Gogotsi, and G. Friedman, Angew. Chem., Int. Ed. ACIEF5 1433-7851 47, 8020 (2008). 10.1002/anie.200802891
-
(2008)
Angew. Chem., Int. Ed.
, vol.47
, pp. 8020
-
-
Staack, D.1
Fridman, A.2
Gutsol, A.3
Gogotsi, Y.4
Friedman, G.5
-
6
-
-
0035969532
-
-
NATUAS 0028-0836,. 10.1038/35107141
-
N. Sano, H. Wang, M. Chhowalla, I. Alexandrou, and G. A. J. Amaratunga, Nature (London) NATUAS 0028-0836 414, 506 (2001). 10.1038/35107141
-
(2001)
Nature (London)
, vol.414
, pp. 506
-
-
Sano, N.1
Wang, H.2
Chhowalla, M.3
Alexandrou, I.4
Amaratunga, G.A.J.5
-
7
-
-
68149182242
-
-
CMATEX 0897-4756,. 10.1021/cm803290b
-
H. Furusho, K. Kitano, S. Hamaguchi, and Y. Nagasaki, Chem. Mater. CMATEX 0897-4756 21, 3526 (2009). 10.1021/cm803290b
-
(2009)
Chem. Mater.
, vol.21
, pp. 3526
-
-
Furusho, H.1
Kitano, K.2
Hamaguchi, S.3
Nagasaki, Y.4
-
8
-
-
27344454866
-
-
JMACEP 0959-9428,. 10.1039/b508420b
-
I. G. Koo, M. S. Lee, J. H. Shim, J. H. Ahn, and W. M. Lee, J. Mater. Chem. JMACEP 0959-9428 15, 4125 (2005). 10.1039/b508420b
-
(2005)
J. Mater. Chem.
, vol.15
, pp. 4125
-
-
Koo, I.G.1
Lee, M.S.2
Shim, J.H.3
Ahn, J.H.4
Lee, W.M.5
-
9
-
-
34948857379
-
-
CMLTAG 0366-7022,. 10.1246/cl.2007.1088
-
K. Furuya, Y. Hirowatari, T. Ishioka, and A. Harata, Chem. Lett. CMLTAG 0366-7022 36, 1088 (2007). 10.1246/cl.2007.1088
-
(2007)
Chem. Lett.
, vol.36
, pp. 1088
-
-
Furuya, K.1
Hirowatari, Y.2
Ishioka, T.3
Harata, A.4
-
10
-
-
46449100602
-
-
JVTAD6 0734-2101,. 10.1116/1.2919139
-
J. Hieda, N. Saito, and O. Takai, J. Vac. Sci. Technol. A JVTAD6 0734-2101 26, 854 (2008). 10.1116/1.2919139
-
(2008)
J. Vac. Sci. Technol. A
, vol.26
, pp. 854
-
-
Hieda, J.1
Saito, N.2
Takai, O.3
-
11
-
-
54149088669
-
-
PPPLA6 1612-8850,. 10.1002/ppa200700094
-
Y. -B. Xie and C. -J. Liu, Plasma Processes Polym. PPPLA6 1612-8850 5, 239 (2008). 10.1002/ppap.200700094
-
(2008)
Plasma Processes Polym.
, vol.5
, pp. 239
-
-
Xie, Y.-B.1
Liu, C.-J.2
-
12
-
-
67049155955
-
-
APPLAB 0003-6951,. 10.1063/1.3129168
-
Y. Shimizu, K. Kawaguchi, T. Sasaki, and N. Koshizaki, Appl. Phys. Lett. APPLAB 0003-6951 94, 191504 (2009). 10.1063/1.3129168
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 191504
-
-
Shimizu, Y.1
Kawaguchi, K.2
Sasaki, T.3
Koshizaki, N.4
-
13
-
-
70350347329
-
-
ADVMEW 0935-9648,. 10.1002/adma.200900673
-
S. Bhattacharyya, D. Staack, E. A. Vitol, R. Singhal, A. Fridman, G. Friedman, and Y. Gogotsi, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 21, 4039 (2009). 10.1002/adma.200900673
-
(2009)
Adv. Mater. (Weinheim, Ger.)
, vol.21
, pp. 4039
-
-
Bhattacharyya, S.1
Staack, D.2
Vitol, E.A.3
Singhal, R.4
Fridman, A.5
Friedman, G.6
Gogotsi, Y.7
-
14
-
-
70449704387
-
-
PPCFET 0741-3335,. 10.1088/0741-3335/51/12/124011
-
T. Kaneko, K. Baba, and R. Hatakeyama, Plasma Phys. Controlled Fusion PPCFET 0741-3335 51, 124011 (2009). 10.1088/0741-3335/51/12/124011
-
(2009)
Plasma Phys. Controlled Fusion
, vol.51
, pp. 124011
-
-
Kaneko, T.1
Baba, K.2
Hatakeyama, R.3
-
15
-
-
53349177349
-
-
APPLAB 0003-6951,. 10.1063/1.2988283
-
C. Richmonds and R. M. Sankaran, Appl. Phys. Lett. APPLAB 0003-6951 93, 131501 (2008). 10.1063/1.2988283
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 131501
-
-
Richmonds, C.1
Sankaran, R.M.2
-
16
-
-
77953002871
-
Continuous-flow, atmospheric-pressure microplasmas: A versatile source for metal nanoparticle synthesis in the gas or liquid phase
-
PSTEEU 0963-0252 (in press).
-
W. -H. Chiang, C. Richmonds, and R. M. Sankaran, " Continuous-flow, atmospheric-pressure microplasmas: a versatile source for metal nanoparticle synthesis in the gas or liquid phase.," Plasma Sources Sci. Technol. PSTEEU 0963-0252 (in press).
-
Plasma Sources Sci. Technol.
-
-
Chiang, W.-H.1
Richmonds, C.2
Sankaran, R.M.3
-
17
-
-
85165643896
-
-
APSPA4 0003-7028,. 10.1366/0003702953964480
-
K. Kneipp, Y. Wang, R. R. Dasari, and M. S. Feld, Appl. Spectrosc. APSPA4 0003-7028 49, 780 (1995). 10.1366/0003702953964480
-
(1995)
Appl. Spectrosc.
, vol.49
, pp. 780
-
-
Kneipp, K.1
Wang, Y.2
Dasari, R.R.3
Feld, M.S.4
-
18
-
-
0037071380
-
-
JCOMEL 0953-8984,. 10.1088/0953-8984/14/18/202
-
K. Kneipp, H. Kneipp, I. Itzkan, R. R. Dasari, and M. S. Feld, J. Phys. Condens. Matter JCOMEL 0953-8984 14, R597 (2002). 10.1088/0953-8984/14/18/202
-
(2002)
J. Phys. Condens. Matter
, vol.14
, pp. 597
-
-
Kneipp, K.1
Kneipp, H.2
Itzkan, I.3
Dasari, R.R.4
Feld, M.S.5
-
19
-
-
61349120717
-
-
JPCCCK 1932-7447,. 10.1021/jp807807j
-
M. V. Caamares, C. Chenal, R. L. Birke, and J. R. Lombardi, J. Phys. Chem. C JPCCCK 1932-7447 112, 20295 (2008). 10.1021/jp807807j
-
(2008)
J. Phys. Chem. C
, vol.112
, pp. 20295
-
-
Caamares, M.V.1
Chenal, C.2
Birke, R.L.3
Lombardi, J.R.4
-
20
-
-
38349192397
-
-
PHTOAD 0031-9228 (),. 10.1063/1.2812122
-
K. Kneipp, Phys. Today PHTOAD 0031-9228 60 (11), 40 (2007). 10.1063/1.2812122
-
(2007)
Phys. Today
, vol.60
, Issue.11
, pp. 40
-
-
Kneipp, K.1
-
21
-
-
0034507019
-
-
JPCBFK 1089-5647,. 10.1021/jp0025476
-
A. M. Michaels, J. Jiang, and L. Brus, J. Phys. Chem. B JPCBFK 1089-5647 104, 11965 (2000). 10.1021/jp0025476
-
(2000)
J. Phys. Chem. B
, vol.104
, pp. 11965
-
-
Michaels, A.M.1
Jiang, J.2
Brus, L.3
-
23
-
-
10944272787
-
-
JPCBFK 1089-5647,. 10.1021/jp048430p
-
A. M. Schwartzberg, C. D. Grant, A. Wolcott, C. E. Talley, T. R. Huser, R. Bogomolni, and J. Z. Zhang, J. Phys. Chem. B JPCBFK 1089-5647 108, 19191 (2004). 10.1021/jp048430p
-
(2004)
J. Phys. Chem. B
, vol.108
, pp. 19191
-
-
Schwartzberg, A.M.1
Grant, C.D.2
Wolcott, A.3
Talley, C.E.4
Huser, T.R.5
Bogomolni, R.6
Zhang, J.Z.7
-
24
-
-
1642325089
-
-
PRLTAO 0031-9007,. 10.1103/PhysRevLett.78.1667
-
K. Kneipp, Y. Wang, H. Kneipp, L. T. Perelman, I. Itzkan, R. Dasari, and M. Feld, Phys. Rev. Lett. PRLTAO 0031-9007 78, 1667 (1997). 10.1103/PhysRevLett. 78.1667
-
(1997)
Phys. Rev. Lett.
, vol.78
, pp. 1667
-
-
Kneipp, K.1
Wang, Y.2
Kneipp, H.3
Perelman, L.T.4
Itzkan, I.5
Dasari, R.6
Feld, M.7
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