Effect of sulphonic acids on electrodeposition of nickel and its structural and corrosion behaviour

Transactions of the Institute of Metal Finishing

Volumn 90, Issue 6, 2012, Pages 324-329

  Sekar, R ^a   Jayakrishnan, S ^a  

^a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

Author keywords

Additives; Citrate bath; Crystal size; Electrodeposition of nickel; Impedance spectroscopy; Polycrystalline

Indexed keywords

CATHODE EFFICIENCY; CITRATE BATHS; CORROSION BEHAVIOUR; CRYSTAL SIZE; ELECTRO-DEPOSITED NICKEL; FCC STRUCTURES; IMPEDANCE SPECTROSCOPY; METHANESULPHONIC ACID; PINHOLE-FREE SURFACES; POLYCRYSTALLINE; SEM ANALYSIS; SOLUTION CHARACTERISTICS; SULPHONIC ACIDS; THROWING POWER;

ADDITIVES; CORROSION RESISTANCE; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTRODEPOSITION; METHANE; NAPHTHALENE; ORGANIC ACIDS; PHENOLS; SPECTROSCOPIC ANALYSIS; SPECTROSCOPY; X RAY DIFFRACTION;

NICKEL;

EID: 84872363528     PISSN: 00202967     EISSN: 17459192     Source Type: Journal    
DOI: 10.1179/0020296712Z.00000000032     Document Type: Article

References (39)

1. F. A. Lowenheim: 'Modern electroplating', 3rd edn; 1974, New York, John Wiley and Sons, Inc.
2. Metal Finishing guide book and directory, 1999:276 Hackensack, NJ, Metals and plastics Publications Inc.
3. J. K. Dennis and T. E. Such: 'Nickel and chromium plating', 97;1993, Cambridge, Woodhead Publishing Ltd.
4. D. Golodniky, N. V. Gudin and G. A. Volyanuk: J. Electrochem. Soc., 2000, 147, 4156-4163.
5. R. Wiart: Electrochim. Acta, 1990, 35, 1587-1592.
6. F. Chassaing, M. Joussellin and R. Wirat: J. Electroanal. Chem., 1983, 157, 75-81.
7. I. Epelboin, M. Joussellin and R. Wirat: J. Electroanal. Chem., 1981, 119, 61-65.
8. S. Watson and R. Walters: J. Electrochem. Soc., 1991, 138, 3633-3637.
9. S. Watson: J. Electrochem. Soc., 1993, 140, 2235-2239.
10. R. Tarozaite, O. Glyliene and G. Stalnionis: Surf. Coat. Technol., 2005, 200, 2208-2213.
11. T. Doi, K. Mizumoto, S. I. Tanakaand and T. Yamashita: Met. Finish., 2004, 102, 26-35.
12. M. Ghorbani, A. G. Dolati and A. Afshar: Russ. J. Electrochem., 2004, 8, 1173-1177.
13. O. Younes and E. Gileadi: J. Electrochem. Soc., 2002, 149, C100-C111.
14. R. Y. Ying: J. Electrochem. Soc., 1988, 135, 2957-2964.
15. T. Doi, K. Mizumoto, M. Kayashima and S. Tanaka J. Surf. Finish. Soc. Jpn, 2000, 51, 718-722.
16. D. Pletcher: 'Industrial electrochemistry', 184;1984, New York, Chapman and Hall.
17. N. Pewnim and S. Roy: Trans. Inst. Met. Finish, 2011, 89, 206-209.
18. F. I. Danilov, I. V. Sknar and Y. E. Sknar: Russ. J. Electrochem, 2011, 47, 1035-1042.
19. R. Sekar and S. Jayakrishnan: Plat. Surf. Finish., 2005, 92, 58-68.
20. R. Sekar and S. Jayakrishnan: J. Appl. Electrochem., 2005, 36, 591-597.
21. R. Sekar, C. Eagammai and S. Jayakrishnan: J. Appl. Electrochem., 2010, 40, 49-57.
22. S. Shawki, F. Hanna and Z. A. Hamid: Met. Finish., 1987, 85, 59-56.
23. B. E. Conway and J. O'M. Bockris: Plating, 1959, 46, 371-383.
24. R. Sekar, C. Kala and R. M. Krishnan: Trans. Inst. Met. Finish., 2002, 80, 173-176.
25. 'Adhesion of metallic coatings', ASTM test method B571-84:1995, 02.05, ASTM International, West Conshohocken, PA, USA, 1995.
26. N. Kanani: 'Electroplating - basic principles, processes and practice', 1st edn, 75;2004, Berlin, Elsevier.
27. M. Stern and A. L. Geary: J. Electrochem. Soc., 1957, 104, 56-63.
28. B. D. Cullity: 'Elements of X-ray diffraction'; 1967, Reading, MA, Addison-Wesley.
29. C. N. Cao and J. Q. Zhang: 'An introduction to electrochemical impedance spectroscopy', 1st edn; 2002, Beijing, Science Press.
30. F. Mansfield, W. Kendig and S. Tsai: Corrosion, 1987, 38, 570-580.
31. S. Survilline, A. Cesuniene and R. Juskena: Trans. Inst. Met. Finish., 2004, 82, 185-189.
32. S. Survilline, A. Lisowska-oleksiak, V. Jasualaitiene and A. Cesuniene: Trans. Inst. Met. Finish., 2005, 83, 130-135.
33. M. Holm and T. J. O'Keefe: J. Appl. Electrochem., 2000, 30, 1125-1132.
34. I. Fomov and M. Monev: J. Appl. Electrochem., 1992, 22, 262-267.
35. Y. Wu, Y. Xiang, W. Hu, C. Zhao and W. Ding: Trans. Inst. Met. Finish., 2005, 2, 91-94.
36. N. V. Pangarov: Electrochim. Acta, 1962, 7, 139-146.
37. N. V. Pangarov: Electrochim. Acta, 1964, 9, 721-726.
38. U. S. Mohanty, B. C. Tripathy, P. Singh and S. C. Das: J. Appl. Electrochem., 2001, 31, 579-583.
39. K. Hang and T. Jenkins: J. Phys. Chem. B, 2000, 104 B, 10017-10021.