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Volumn 40, Issue 1, 2010, Pages 49-57
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Effect of additives on electrodeposition of tin and its structural and corrosion behaviour
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Author keywords
Additives; Atomic force microscopy; Electrochemical impedance; Potentiodynamic polarization; SEM analysis; Tin electrodeposit; XRD studies
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Indexed keywords
AFM;
CHLORIDE ELECTROLYTES;
CORROSION BEHAVIOUR;
CORROSION RATE MEASUREMENTS;
ELECTROCHEMICAL IMPEDANCE;
FREE SURFACES;
GRAIN REFINING;
GRAIN SIZE;
PLATING BATH;
POLYCRYSTALLINE;
SEM ANALYSIS;
TAFEL EXTRAPOLATIONS;
TETRAGONAL STRUCTURE;
XRD;
XRD STUDIES;
APPROXIMATION THEORY;
ATOMIC FORCE MICROSCOPY;
CHLORINE COMPOUNDS;
CORROSION RESISTANCE;
ELECTROCHEMICAL CORROSION;
ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY;
ELECTROPLATING;
PHENOLS;
PHOSPHATASES;
POLARIZATION;
POLYETHYLENE GLYCOLS;
POLYETHYLENE OXIDES;
POTENTIODYNAMIC POLARIZATION;
TIN;
TITANIUM COMPOUNDS;
X RAY DIFFRACTION;
TIN DEPOSITS;
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EID: 73349141971
PISSN: 0021891X
EISSN: None
Source Type: Journal
DOI: 10.1007/s10800-009-9963-6 Document Type: Article |
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Times cited : (47)
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References (36)
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