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Volumn 15, Issue 5, 2013, Pages 1443-1451

Formation of an electron hole doped film in the α-Fe 2O3 photoanode upon electrochemical oxidation

(9) Gajda Schrantz, Krisztina a,b Tymen, Simon a,c Boudoire, Florent a,d Toth, Rita a Bora, Debajeet K a,d Calvet, Wolfram e,f Grätzel, Michael g Constable, Edwin C d Braun, Artur a

a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY (Switzerland)

b UNIVERSITY OF SZEGED (Hungary)

c UNIVERSITÉ DE PAU ET DES PAYS DE L'ADOUR (France)

d UNIVERSITY OF BASEL (Switzerland)

e DARMSTADT UNIVERSITY OF TECHNOLOGY (Germany)

f HAHN MEITNER INSTITUT (Germany)

g EPFL (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84872081502 PISSN: 14639076 EISSN: None Source Type: Journal
DOI: 10.1039/c2cp42597a Document Type: Article

Times cited : (43)

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