Microscopic picture of aging in SiO2

Physical Review Letters

Volumn 110, Issue 1, 2013, Pages

  Vollmayr Lee, Katharina ^a   Bjorkquist, Robin ^b   Chambers, Landon M ^c  

^a BUCKNELL UNIVERSITY   (United States)

^b Cornell University   (United States)

^c TEXAS A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGING DYNAMICS; FRAGILE GLASS; GLASS FORMER; HIGH TEMPERATURE; JUMP LENGTH; MOLECULAR DYNAMICS SIMULATIONS; PER UNIT; SINGLE PARTICLE TRAJECTORIES; TEMPERATURE QUENCH; WAITING-TIME;

GLASS; MOLECULAR DYNAMICS;

DYNAMICS;

SILICON DIOXIDE;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; METHODOLOGY; MICROSCOPY; MOLECULAR DYNAMICS; TEMPERATURE;

MICROSCOPY; MODELS, CHEMICAL; MOLECULAR DYNAMICS SIMULATION; SILICON DIOXIDE; TEMPERATURE;

EID: 84872025086     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.110.017801     Document Type: Article

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