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Journal of Nano- and Electronic Physics

Volumn 4, Issue 4, 2012, Pages

Preparation and characterization of nio thin films by DC reactive magnetron sputtering

(4) Ashok Kumar Reddy, Y a Mallikarjuna Reddy, A a Sivasankar Reddy, A b Sreedhara Reddy, P a

a SRI VENKATESWARA UNIVERSITY (India)

b Kongju National University (South Korea)

Author keywords

Electrical properties; Nio thin films; Optical properties; Oxygen partial pressure; Sputtering; Structural properties

Indexed keywords

EID: 84871970154 PISSN: 20776772 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.