One-step microstructuring of TiO2 and Ag-TiO2 films by continuous wave laser processing in the UV and visible ranges

Journal of Physical Chemistry C

Volumn 116, Issue 51, 2012, Pages 26857-26864

  Crespo Monteiro, N ^a,d,e   Destouches, N ^a,d,e   Saviot, L ^b   Reynaud, S ^a,d,e   Epicier, T ^c   Gamet, E ^a,d,e   Bois, L ^a   Boukenter, A ^a,d,e  

^a UNIVERSITÉ DE LYON   (France)

^b UNIVERSITÉ DE BOURGOGNE   (France)

^c UNIVERSITÉ DE LYON   (France)

^d UNIVERSITÉ JEAN MONNET   (France)

^e UNIVERSITÉ JEAN MONNET   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS TIO; CONTINUOUS WAVES; INTENSITY THRESHOLD; LASER-INDUCED CRYSTALLIZATION; MESOPOROUS FILMS; MICRO STRUCTURING; PHOTOCHROMIC BEHAVIOR; RUTILE PHASIS; SILVER NANOPARTICLES; SILVER SALTS; SUBMICROMETERS; TEMPERATURE RISE; TIO; UV- AND; VISIBLE LIGHT; VISIBLE RANGE; VISIBLE WAVELENGTHS;

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CONTINUOUS WAVE LASERS; NANOPARTICLES; OXIDE MINERALS; RAMAN SPECTROSCOPY; TITANIUM DIOXIDE;

SILVER;

EID: 84871650965     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp3096264     Document Type: Article

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