Deposition of au thin films and nanoparticles by MOCVD

Chemical Vapor Deposition

Volumn 18, Issue 10-12, 2012, Pages 336-342

  Parkhomenko, Roman G ^a   Morozova, Natalia B ^a   Zharkova, Galina I ^a   Shubin, Yuri V ^a   Trubin, Sergey V ^a   Kriventsov, Vladimir V ^b   Kuchumov, Boris M ^a   Koretskaya, Tatiana P ^a   Igumenov, Igor K ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^b BORESKOV INSTITUTE OF CATALYSIS   (Russian Federation)

Author keywords

Gold nanoparticles; MOCVD; Morphology; Thin films; VUV activation

Indexed keywords

AU THIN FILMS; CVD REACTORS; DEPOSITED LAYER; DEPOSITION PROCESS; GOLD FILM; GOLD NANOPARTICLES; IMPURITIES IN; LOW PRESSURES; METAL-ORGANIC; PHASE ANALYSIS; REACTANT GAS; S-DONOR LIGANDS; ULTRA-THIN; VACUUM ULTRAVIOLETS;

CHEMICAL VAPOR DEPOSITION; GOLD; GOLD COATINGS; HYDROGEN; METAL NANOPARTICLES; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; ORGANOMETALLICS; THIN FILMS; X RAY DIFFRACTION;

DEPOSITION;

EID: 84871313284     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.201207004     Document Type: Article

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