Oxygen-free precursor for chemical vapor deposition of gold films: Thermal properties and decomposition mechanism

Gold Bulletin

Volumn 44, Issue 3, 2011, Pages 177-184

  Turgambaeva, Asiya E ^a   Zharkova, Galina ^a   Semyannikov, Petr ^a   Krisyuk, Vladislav V ^a   Koretskaya, Tatyana ^a   Trubin, Sergey ^a   Kuchumov, Boris ^a   Igumenov, Igor ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

Dimethylgold diethyldithiocarbamate; Gold films; Metallorganic CVD; Thermal properties; Thermolysis mechanism; Volatile complex of dimethylgold

Indexed keywords

CHEMICAL STABILITY; CHEMICAL VAPOR DEPOSITION; GOLD COMPOUNDS; GOLD METALLOGRAPHY; LIGANDS; MASS SPECTROMETRY; METALLIC FILMS; ORGANOMETALLICS; OXYGEN; TEMPERATURE DISTRIBUTION; THERMODYNAMIC PROPERTIES; X RAY PHOTOELECTRON SPECTROSCOPY;

DECOMPOSITION MECHANISM; DIETHYLDITHIOCARBAMATE; GOLD FILM; SATURATED VAPOR PRESSURE; SPECTROMETRIC TECHNIQUES; TEMPERATURE DEPENDENCE; THERMOLYSIS MECHANISM; VOLATILE COMPLEX OF DIMETHYLGOLD;

DECOMPOSITION;

EID: 84856347661     PISSN: 00171557     EISSN: None     Source Type: Journal    
DOI: 10.1007/s13404-011-0026-5     Document Type: Article

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