The influence of surface structure on H4SiO4 oligomerization on rutile and amorphous TiO2 surfaces: An ATR-IR and synchrotron XPS study

Langmuir

Volumn 28, Issue 49, 2012, Pages 16890-16899

  Song, Yantao ^a   Swedlund, Peter J ^a   McIntosh, Grant J ^a   Cowie, Bruce C C ^b   Waterhouse, Geoffrey I N ^a   Metson, James B ^a  

^a UNIVERSITY OF AUCKLAND   (New Zealand)

^b AUSTRALIAN SYNCHROTRON   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS TIO; DISORDERED SURFACES; LATERAL INTERACTIONS; LINEAR TRIMER; METAL OXIDE SURFACES; NATURAL AQUATIC SYSTEMS; OXYGEN ATOM; PHOTOELECTRON PEAKS; RUTILE PHASE; SILICIC ACIDS; SITU ATR-IR; SORPTION SITES; SPATIAL ARRANGEMENTS; SPATIAL SEPARATION; SURFACE COVERAGES; SURFACE CURVATURES; SURFACE SITES; TIO;

BINDING ENERGY; METALLIC COMPOUNDS; MONOMERS; OLIGOMERIZATION; OXIDE MINERALS; POLYMERS; SILICATES; SILICON; SORPTION; SURFACE STRUCTURE; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

OLIGOMERS;

EID: 84870871150     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la3032623     Document Type: Article

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