Application of Fered-Fenton and chemical precipitation process for the treatment of electroless nickel plating wastewater

Separation and Purification Technology

Volumn 104, Issue , 2013, Pages 100-105

  Shih, Yu Jen ^a   Lin, Chih Ping ^a   Huang, Yao Hui ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Cathodic deposition; Current density; Hydroxyl radical; Hypophosphite

Indexed keywords

ALKALINE PRECIPITATION; CATALYTIC EFFICIENCIES; CATHODIC DEPOSITION; CHEMICAL OXIDATION; CHEMICAL PRECIPITATION; COD REMOVAL; ELECTROLESS NICKEL PLATING; FENTON REACTIONS; FERROUS ION; HYDROXYL RADICALS; HYPOPHOSPHITE; NICKEL IONS; NICKEL REMOVAL; OPTIMAL CONDITIONS; REAL WASTEWATER; SUCCESSFUL MANAGEMENT;

ALKALINITY; CHELATION; CHEMICAL OXYGEN DEMAND; CITRIC ACID; CURRENT DENSITY; EFFLUENTS; ELECTROLESS PLATING; IONS; NICKEL; NICKEL PLATING;

PRECIPITATION (CHEMICAL);

EID: 84870807187     PISSN: 13835866     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.seppur.2012.11.025     Document Type: Article

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