Formation mechanism and influence rules of trace levels H2O on SF6 characteristic decomposition components under partial discharge

Diangong Jishu Xuebao/Transactions of China Electrotechnical Society

Volumn 27, Issue 10, 2012, Pages 13-19

  Tang, Ju ^a   Qiu, Yinjun ^b   Zeng, Fuping ^a   Yuan, Jingfan ^b   Zhang, Xiaoxing ^a  

^a CHONGQING UNIVERSITY   (China)

^b Hainan Electric Power Corporation   (China)

Author keywords

Composition analysis; Decomposed components; H2O; Partial discharge; SF6

Indexed keywords

COMPONENT CONCENTRATION; COMPOSITION ANALYSIS; CONCENTRATION RATIO; DECOMPOSED COMPONENTS; DECOMPOSITION COMPONENTS; ELECTRICAL EQUIPMENT; FORMATION MECHANISM; GAS CHROMATOGRAPHS; INFLUENCE RULE; INHIBITION EFFECT; PROMOTING EFFECT; SF6; TESTING APPARATUS; TRACE LEVEL;

CARBON DIOXIDE; PARTIAL DISCHARGES; SULFUR DIOXIDE;

SULFUR HEXAFLUORIDE;

EID: 84870734596     PISSN: 10006753     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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