Pulsed laser deposition to synthesize the bridge structure of artificial nacre: Comparison of nano- and femtosecond lasers

Journal of Applied Physics

Volumn 112, Issue 10, 2012, Pages

  Melaibari, Ammar A ^a,b   Molian, Pal ^a  

^a Iowa State University   (United States)

^b KING ABDULAZIZ UNIVERSITY   (Saudi Arabia)

Author keywords

[No Author keywords available]

Indexed keywords

ADAPTIVE TECHNOLOGY; BRIDGE STRUCTURES; DEPOSITION TIME; FEMTOSECONDS; HARD PHASE; INDUSTRIAL ACCEPTANCE; ITERATIVE APPROACH; LATERAL DIMENSION; LOW COSTS; MANUFACTURING PROCESS; MECHANICAL BEHAVIOR; OPTICAL PROFILOMETER; PARTICULATE FORMATION; PULSE ENERGIES; SYNTHETIC MATERIALS; THIN-FILM DEPOSITIONS; UNIFORM-SIZED;

BRICK; BRIDGES; FILM THICKNESS; GEMS; PHOTOELECTRONS; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

LASERS;

EID: 84870667701     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4765734     Document Type: Article

References (38)

1. B. Bhushan, Philos. Trans. R. Soc. London, Ser. A 367, 1445 (2009). 10.1098/rsta.2009.0011
2. M. A. Meyers, P. Y. Chen, Y. M. Lin, and Y. Seki, Prog. Mater. Sci. 53, 1 (2008). 10.1016/j.pmatsci.2007.05.002
3. J. L. Arias and M. S. Fernández, Mater. Charact. 50, 189 (2003). 10.1016/S1044-5803(03)00088-3
4. Z. Tang, N. A. Kotov, S. Magonov, and B. Ozturk, Nature Mater. 2, 413 (2003). 10.1038/nmat906
5. G. M. Luz and J. F. Mano, Philos. Trans. R. Soc. London, Ser. A 367, 1587 (2009). 10.1098/rsta.2009.0007
6. E. Munch, M. E. Launey, D. H. Alsem, E. Saiz, A. P. Tomsia, and R. O. Ritchie, Science 322, 1516 (2008). 10.1126/science.1164865
7. B. A. Cook, J. L. Harringa, T. L. Lewis, and A. M. Russell, Scr. Mater. 42, 597 (2000). 10.1016/S1359-6462(99)00400-5
8. B. A. Cook, J. L. Harringa, T. L. Lewis, A. M. Russell, and Y. Lee, J. Adv. Mater. 36, 56 (2004).
9. R. Cherukuri, M. Womack, P. Molian, A. Russell, and Y. Tian, Surf. Coat. Technol. 155, 112 (2002). 10.1016/S0257-8972(02)00050-6
10. Y. Tian, A. F. Bastawros, C. C. H. Lo, A. P. Constant, A. M. Russell, and B. A. Cook, Appl. Phys. Lett. 83, 2781 (2003). 10.1063/1.1615677
11. M. Jelinek, V. Trtik, and L. Jastrabik, Pulsed laser deposition of thin films., in Physics and Materials Science of High Temperature Superconductors, IV, NATO Science Series Vol. 26, Part III, edited by, R. Kossowsky, M. Jelinek, J. Novak, (Springer, Netherlands, 1997), pp. 215-231.
12. J. Dieleman, E. van de Riet, and J. C. S. Kools, Jpn. J. Appl. Phys., Part 1 31, 1964 (1992). 10.1143/JJAP.31.1964
13. Z. Zhang, Y. Zhang, and H. Gao, Proc. R. Soc. London, Ser. B 278, 519 (2010). 10.1098/rspb.2010.1093
14. See page 3, Shearing section, of this site: http://www.kobelco.co.jp/ english/titan/files/details.pdf for information about shearing in titanium. (accessed on 06/26/ 2012).
15. M. A. Meyers, A. Y. Lin, P. Chen, and J. Muyco, J. Mech. Behav. Biomed. Mater. 1, 76 (2008). 10.1016/j.jmbbm.2007.03.001
16. R. Z. Wang, Z. Suo, A. G. Evans, N. Yao, and I. A. Aksay, J. Mater. Res. 16, 2485 (2001). 10.1557/JMR.2001.0340
17. A. G. Evans, Z. Suo, R. Z. Wang, I. A. Aksay, M. Y. He, and J. W. Hutchinson, J. Mater. Res. 16, 2475 (2001). 10.1557/JMR.2001.0339
18. H. Gao, B. Ji, I. L. Jager, E. Arzt, and P. Fratzl, Proc. Natl. Acad. Sci. U.S. A. 100, 5597 (2003). 10.1073/pnas.0631609100
19. J. R. Cahoon, W. H. Broughton, and A. R. Kutzak, Metall. Mater. Trans. B 2, 1979 (1971). 10.1007/BF02913433
20. R. Morales, S. Seetharaman, and V. Agarwal, J. Mater. Res. 17, 1954 (2002). 10.1557/JMR.2002.0289
21. Y. Tian, M. Womack, P. Molian, C. H. Lo, J. W. Anderegg, and A. M. Russell, Thin Solid Films 418, 129 (2002). 10.1016/S0040-6090(02)00766-6
22. M. Stock and P. Molian, J. Vac. Sci. Technol. A 22, 670 (2004). 10.1116/1.1722714
23. H. Sankur and J. T. Chung, Appl. Phys. A 47, 271 (1988). 10.1007/BF00615933
24. L. Landstrom, Zs. Marton, N. Arnold, H. Hogberg, M. Boman, and P. Heszler, J. Appl. Phys. 94, 2011 (2003). 10.1063/1.1587253
25. M. Mendes and R. Vilar, Appl. Surf. Sci. 217, 149 (2003). 10.1016/S0169-4332(03)00530-0
26. E. W. Kreutz and J. Gottmann, Phys. Status Solidi A 166, 569 (1998). 10.1002/(SICI)1521-396X(199804)166:2<569::AID-PSSA569>3.0.CO;2-U
27. Y. Watanabe, M. Tanamura, S. Matsumoto, and Y. Seki, J. Appl. Phys. 78, 2029 (1995). 10.1063/1.360179
28. W. Siew, W. Lee, H. Wong, T. Yong, S. Yap, and T. Tou, Appl. Phys. A 101, 627 (2010). 10.1007/s00339-010-5914-7
29. L. Guan, D. Zhang, X. Li, and Z. Li, Nucl. Instrum. Methods Phys. Res. B 266, 57 (2008). 10.1016/j.nimb.2007.10.011
30. W. Zhaoyang, S. Liyuan, and H. Lizhong, Vacuum 85, 397 (2010). 10.1016/j.vacuum.2010.07.015
31. Y.-L. Wang, W. Xu, Y. Zhou, L.-Z. Chu, and G.-S. Fu, Laser Part. Beams 25, 9 (2007). 10.1017/S0263034607070024
32. R. K. Singh and J. Narayan, Phys. Rev. B 41, 8843 (1990). 10.1103/PhysRevB.41.8843
33. S. V. Pysarenko, A. V. Pan, and S. X. Dou, IEEE Trans. Appl. Supercond. 21, 3179 (2011). 10.1109/TASC.2010.2092404
34. J. P. Zheng and H. S. Kwok, Thin Solid Films 232, 99 (1993). 10.1016/0040-6090(93)90769-L
35. H. S. Kim and H. S. Kwok, Appl. Phys. Lett. 61, 2234 (1992). 10.1063/1.108278
36. Z. Zhang, P. A. VanRompay, J. A. Nees, and P. P. Pronko, J. Appl. Phys. 92, 2867 (2002). 10.1063/1.1497449
37. X. Zenga, X. Mao, R. Greif, and R. E. Russo, Ultraviolet Femtosecond and Nanosecond Laser Ablation of Silicon: Ablation Efficiency and Laser-Induced Plasma Expansion (Lawrence Berkeley National Laboratory, 2004), http://www.osti.gov/bridge/servlets/purl/836676-ys4GaX/native/836676.pdf (accessed on 06/26/ 2012).
38. R. Eason, Pulsed Laser Deposition of Thin Films (John Wiley and Sons, Inc., Hoboken, New Jersey, 2007).