A dissociative electron attachment cross-section estimator

Journal of Physics: Conference Series

Volumn 388, Issue PART 1, 2012, Pages

  Munro, James J ^a,b   Harrison, Stephen ^a   Fujimoto, Milton M ^a,c   Tennyson, Jonathan ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b Quantemol Ltd   (United Kingdom)

^c FEDERAL UNIVERSITY OF PARANÁ   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATION; ESTIMATION; EXPERT SYSTEMS; MOLECULAR OXYGEN; PHOTODISSOCIATION;

DISSOCIATIVE ELECTRON ATTACHMENT; LOW-ENERGY PLASMA; MOLECULAR CHLORINE; QUANTEMOL; R-MATRIX METHOD; RESONANCE POSITIONS AND WIDTHS; SECTION ESTIMATORS; SURVIVAL MODEL;

ELECTRON ENERGY ANALYZERS;

EID: 84870587946     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/388/1/012013     Document Type: Conference Paper

References (22)

1. Morgan W 2000 Adv. At. Mol. Opt. Phys. 43 79-110
2. Kimura M 2001 Adv. At. Mol. Opt. Phys. 44 33-57
3. Winstead C and Mckoy V 2000 Adv. At. Mol. Opt. Phys. 43 111-145
4. Fabrikant I I 2010 J. Phys. Conf. Ser. 204 012004
5. Celiberto R, Janev R K, Wadehra J M and Tennyson J 2012 Chem. Phys. 398 206-213
6. Haxton D J, Rescigno T N and McCurdy C W 2007 Phys. Rev. A 75 012711
7. Tennyson J 2010 Phys. Rep. 491 29-76
8. Tennyson J, Brown D B, Munro J J, Rozum I, Varambhia H N and Vinci N 2007 J. Phys. Conf. Ser. 86 012001
9. Tennyson J and Noble C J 1984 Comput. Phys. Commun. 33 421-424
10. Faure A, Gorfinkiel J D, Morgan L A and Tennyson J 2002 Comput. Phys. Commun. 144 224-241
11. Morgan L A, Tennyson J and Gillan C J 1998 Comput. Phys. Commun. 114 120-128
12. Carr J M, Galiatsatos P G, Gorfinkiel J D, Harvey A G, Lysaght M A, Madden D, Masin Z, Plummer M and Tennyson J 2012 Euro. J. Phys. D 66 58
13. Kurepa M V and Belic D S 1978 J. Phys. B: At. Mol. Phys. 11 3719-3729
14. Fabrikant I I, Leininger T and Gadea F X 2000 J. Phys. B: At. Mol. Opt. Phys. 33 4575-4580
15. Tam W C and Wong S F 1978 J. Chern. Phys. 68 5626-5630
16. Rapp D and Briglia D D 1965 J. Chem. Phys. 43 1480-1489
17. Noble C J and Burke P G 1992 Phys. Rev. Lett. 68 2011-2014
18. Tashiro M, Morokuma K and Tennyson J 2006 Phys. Rev. A 73 052707
19. Prabhudesai V S, Nandi D and Krishnakumar E 2006 J. Phys. B: At. Mol. Phys. 39 L277-L283
20. Gorfinkiel J D and Tennyson J 2004 J. Phys.B: At. Mol. Opt. Phys. 37 L343-L350
21. Gorfinkiel J D and Tennyson J 2005 J. Phys.B: At. Mol. Opt. Phys. 38 1607-1622
22. Munro J J, Walker B and Kang S Y 2011 Predicting plasma in wafer etch and deposition via quantum mechanics Solid State Technology: Insight for Electronic Manufacturing