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Volumn 44, Issue C, 2001, Pages 33-57

Theoretical consideration of plasma-processing processes

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Indexed keywords


EID: 0006420563     PISSN: 1049250X     EISSN: None     Source Type: Book Series    
DOI: 10.1016/S1049-250X(01)80028-8     Document Type: Article
Times cited : (3)

References (32)
  • 8
    • 0008275645 scopus 로고    scopus 로고
    • Radical measurements in plasma processing
    • Academic Press, San Diego
    • Goto T. Radical measurements in plasma processing. Advances in Atomic Molecular, and Optical Physics 44 (2000), Academic Press, San Diego
    • (2000) Advances in Atomic Molecular, and Optical Physics , vol.44
    • Goto, T.1
  • 15
    • 0001350670 scopus 로고    scopus 로고
    • Radio-frequency plasma modeling for low-temperature processings
    • Academic Press, San Diego
    • Makabe T. Radio-frequency plasma modeling for low-temperature processings. Advances in Atomic, Molecular, and Optical Physics 44 (2000), Academic Press, San Diego
    • (2000) Advances in Atomic, Molecular, and Optical Physics , vol.44
    • Makabe, T.1
  • 19
    • 0003492552 scopus 로고
    • For general aspects resulting from atomic collisions, see, for example, John Wiley & Sons, Inc., New York
    • For general aspects resulting from atomic collisions, see, for example. McDaniel E.W. Atomic Collisions (Electron and Photon Projectiles (1992), John Wiley & Sons, Inc., New York
    • (1992) Atomic Collisions (Electron and Photon Projectiles
    • McDaniel, E.W.1
  • 30
    • 33645335532 scopus 로고    scopus 로고
    • Mechanisms of electron transport in electrical discharges and electron collision cross sections
    • Academic Press, San Diego
    • Tanaka H., and Sueoka O. Mechanisms of electron transport in electrical discharges and electron collision cross sections. Advances in Atomic, Molecular, and Optical Physics 44 (2000), Academic Press, San Diego
    • (2000) Advances in Atomic, Molecular, and Optical Physics , vol.44
    • Tanaka, H.1    Sueoka, O.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.