Growth and thermal stability of (V,Al)2Cx thin films

Journal of Materials Research

Volumn 27, Issue 19, 2012, Pages 2511-2519

  Jiang, Yan ^a   Iskandar, Riza ^a   Baben, Moritz To ^a   Takahashi, Tetsuya ^a   Zhang, Jie ^a   Emmerlich, Jens ^a   Mayer, Joachim ^b   Polzer, Conrad ^a   Polcik, Peter ^a   Schneider, Jochen M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b PLANSEE COMPOSITE MATERIALS GMBH   (Germany)

Author keywords

crystal growth; sputtering; texture

Indexed keywords

ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; ATOMIC ORDERING; BASAL PLANES; COMPOSITE TARGET; DIRECT CURRENT MAGNETRON SPUTTERING; MAX-PHASE; NUCLEATION AND GROWTH; TEM IMAGES; TRANSMISSION ELECTRON MICROSCOPY TEM; VANADIUM CARBIDES;

ALUMINUM COATINGS; ANNEALING; CARBIDES; CRYSTAL GROWTH; DEPOSITS; LATTICE CONSTANTS; SOLID SOLUTIONS; SPUTTERING; STOICHIOMETRY; TEXTURES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ALUMINUM;

EID: 84870265198     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2012.202     Document Type: Article

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