Fabrication of patterned TiO2 thin film by a wet process

Metals and Materials International

Volumn 18, Issue 5, 2012, Pages 833-837

  Kim, Jin Ho ^a   Lee, Mi Jai ^a   Kim, Seiki ^a   Hwang, Jonghee ^a   Lim, Tae Young ^a   Kim, Sae Hoon ^b  

^a Korea Institute of Ceramic Engineering and Technology (KICET)   (South Korea)

^b Gangneung Wonju National University   (South Korea)

Author keywords

Coating; Nanostructured materials; Surface modification; Thin films; Wetting

Indexed keywords

ATOMIC FORCE MICROSCOPY; COATINGS; CONTACT ANGLE; DEPOSITION; FABRICATION; FILM PREPARATION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; OXIDE MINERALS; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SHOTCRETING; SUBSTRATES; SUPERHYDROPHOBICITY; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; SURFACE TREATMENT; TIO2 NANOPARTICLES; TITANIUM DIOXIDE; URANIUM METALLOGRAPHY; VANADIUM METALLOGRAPHY; WETTING;

FIELD EMISSION SCANNING ELECTRON MICROSCOPES; HYDROPHOBIC TREATMENT; HYDROPHOBIC/HYDROPHILIC; LAYER BY LAYER SELF ASSEMBLY; LIQUID PHASE DEPOSITION METHOD (LPD); PHOTOCATALYTIC PROPERTY; SUPER-HYDROPHOBIC SURFACES; UV-VIS SPECTROPHOTOMETERS;

THIN FILMS;

EID: 84869473081     PISSN: 15989623     EISSN: 20054149     Source Type: Journal    
DOI: 10.1007/s12540-012-5013-8     Document Type: Article

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