Influence of V +-implantation on structural, chemical, optical and nanomechanical properties of TiO 2 films

Vacuum

Volumn 89, Issue 1, 2013, Pages 147-152

  Hou, Xinggang ^a   Ma, Jun ^a   Li, Dejun ^a   Wang, Xuemin ^a   Shen, Yixiao ^a   Yu, Tao ^a  

^a TIANJIN NORMAL UNIVERSITY   (China)

Author keywords

Implantation; Refractive index; Surface structural; TiO 2 films

Indexed keywords

CHEMICAL CHARACTERIZATION; GRAIN SIZE; IMPLANTED IONS; METAL VAPOR VACUUM ARCS; NANOMECHANICAL PROPERTY; TIO;

DEPOSITS; ENERGY GAP; ION IMPLANTATION; IONS; REFRACTIVE INDEX; SOL-GEL PROCESS; THIN FILMS; VACUUM APPLICATIONS; VAPORS;

TITANIUM DIOXIDE;

EID: 84869083561     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2012.03.007     Document Type: Conference Paper

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