α-pinene photooxidation under controlled chemical conditions-Part 2: SOA yield and composition in low-and high-NOx environments

Atmospheric Chemistry and Physics

Volumn 12, Issue 16, 1999, Pages 7413-7427

  Eddingsaas, N C ^a   Loza, C L ^a   Yee, L D ^b   Chan, M ^b   Schilling, K A ^a   Chhabra, P S ^a,d   Seinfeld, J H ^a,b   Wennberg, P O ^b,c  

^a California Institute of Technology   (United States)

^b California Institute of Technology   (United States)

^c CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^d AERODYNE RESEARCH INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDITY; AEROSOL COMPOSITION; AMMONIUM SULFATE; CARBOXYLIC ACID; CHEMICAL COMPOSITION; CONCENTRATION (COMPOSITION); HYDROXIDE; NITROGEN OXIDES; OZONE; PHOTOOXIDATION; SULFURIC ACID; TRACER;

EID: 84869044531     PISSN: 16807316     EISSN: 16807324     Source Type: Journal    
DOI: 10.5194/acp-12-7413-2012     Document Type: Article

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