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Volumn 22, Issue 43, 2012, Pages 23098-23105

In situ TPR removal: A generic method for fabricating tubular array devices with mechanical and structural soundness, and functional robustness on various substrates

(6) Zhang, Zhonghua a Gao, Haiyong a Cai, Wenjie a Liu, Caihong a Guo, Yanbing a Gao, Pu Xian a

a UNIVERSITY OF CONNECTICUT (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY METAL OXIDES; CHEMICAL HOMOGENEITY; CHEMICAL PURITY; COMPLEX OXIDES; FUNCTIONAL OXIDES; GENERIC METHOD; HIGH TEMPERATURE; IN-SITU; KIRKENDALL; NANOTUBE ARRAYS; PHOTOCATALYTIC DEVICES; POST TREATMENT; REMOVAL METHOD; STRUCTURAL SOUNDNESS; SUBSTRATE GEOMETRY; SUPER CAPACITOR; TEMPERATURE-PROGRAMMED REDUCTION; TEMPLATE REMOVAL; TUBULAR STRUCTURES; VARIOUS SUBSTRATES; WIRE ARRAYS; ZNO NANOROD ARRAYS;

COBALT COMPOUNDS; NANORODS; NANOTUBES; PEROVSKITE; THREE DIMENSIONAL; WET ETCHING; ZINC OXIDE;

INTERFACES (MATERIALS);

EID: 84867515017 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c2jm34606k Document Type: Article

Times cited : (14)

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