Modifying the conductivity of polypyrrole through low-energy lead ion implantation

Materials Chemistry and Physics

Volumn 136, Issue 2-3, 2012, Pages 903-909

  Booth, Marsilea Adela ^a,b   Leveneur, Jérôme ^a,c   Costa, Alexsandro Santos ^a   Kennedy, John ^c,d   Harbison, Sallyann ^a,b   Travas Sejdic, Jadranka ^a,d  

^a UNIVERSITY OF AUCKLAND   (New Zealand)

^b MT ALBERT RESEARCH CENTRE   (New Zealand)

^c GNS SCIENCE   (New Zealand)

^d MACDIARMID INSTITUTE FOR ADVANCED MATERIALS AND NANOTECHNOLOGY   (New Zealand)

Author keywords

Composite materials; Electrical conductivity; Ion implantation; Irradiation effects; Semiconductors

Indexed keywords

BASE MATERIAL; BEAM DAMAGE; CONDUCTING POLYPYRROLE FILMS; DICATIONS; ELECTRICAL CONDUCTIVITY; ENHANCED CONDUCTIVITY; FLUENCES; IMPLANTED MATERIALS; IRRADIATION EFFECT; LEAD IONS; LOW ENERGIES; POLYMER DEGRADATION; POLYPYRROLE FILM;

COMPOSITE MATERIALS; CONDUCTIVE FILMS; ELECTRIC CONDUCTIVITY; LEAD; NANOCOMPOSITES; POLYPYRROLES; PRECIPITATION (CHEMICAL); SEMICONDUCTOR MATERIALS; TRANSMISSION ELECTRON MICROSCOPY;

ION IMPLANTATION;

EID: 84867404283     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2012.08.017     Document Type: Article

References (46)

1. M. Niklaus, S. Rosset, M. Dadras, P. Dubois, and H. Shea Scr. Mater. 59 2008 893
2. M. Niklaus, and H. Shea Acta Mater. 59 2011 830
3. W. Chen, C.M. Li, P. Chen, and C. Sun Electrochim. Acta 52 2007 2845
4. V.C. Ferreira, A.I. Melato, A.F. Silva, and L.M. Abrantes Electrochem. Commun. 13 2011 993
5. L. Cen, K. Neoh, Q. Cai, and E. Kang J. Colloid Interface. Sci. 300 2006 190
6. M.A. Booth, J. Leveneur, A.S. Costa, J.V. Kennedy, and J. Travas-Sejdic J. Phys. Chem. C 116 2012 8236
7. K. Elayaraja, P. Rajesh, M. Ahymah Joshy, V. Sarath Chandra, R. Suganthi, J. Kennedy, P. Kulriya, I. Sulania, K. Asokan, and D. Kanjilal Mater. Chem. Phys. 134 2012 464
8. P. Townsend Rep. Prog. Phys. 50 1987 501
9. S. Schiestel, W. Ensinger, and G. Wolf Nucl. Instrum. Meth. B 91 1994 473
10. A. Hussain, and A. Kumar Eur. Phys. J. Appl. Phys. 36 2006 105
11. J.F. Ziegler Nucl. Instrum. Meth. B 6 1985 270
12. G.K. Wolf, and W. Ensinger Ullmann's Encyclopedia of Industrial Chemistry 2000 Wiley-VCH Verlag GmbH & Co. KGaA
13. G. Bidan, M. Billon, M. Calvo-Munoz, and A. Dupont-Fillard Mol. Cryst. Liq. Cryst. 418 2004 255
14. A. Kaur, A. Dhillon, and D. Avasthi J. Appl. Phys. 106 2009 073715
15. A. Hussain, D. Saikia, F. Singh, D. Avasthi, and A. Kumar Nucl. Instrum. Meth. B 240 2005 834
16. G. Alici, A. Punning, and H.R. Shea Sens. Actuators B-Chem. 157 2011 72
17. Z. Iskanderova, J. Kleiman, Y. Gudimenko, W. Morison, and R. Tennyson Nucl. Instrum. Meth. B 127 1997 702
18. R. Ramola, A. Alqudami, S. Chandra, S. Annapoorni, J. Rana, R. Sonkawade, F. Singh, and D. Avasthi Radiat. Eff. Defect Solids 163 2008 139
19. S. Schiestel, and G.K. Wolf Synth. Met. 67 1994 273
20. L. Zhao-Min, Z. Jin-Liang, G. Ye-Ping, Y. Zheng-Wen, Q. Ping-Po, and M. Zue-Teh Nucl. Instrum. Meth. B 91 1994 465
21. N. Lassalle, P. Mailley, E. Vieil, T. Livache, A. Roget, J. Correia, and L. Abrantes J. Electroanal. Chem. 509 2001 48
22. R. Islah-u-din, M.R. Fox, H. Martin, G.J. Gainsford, J. Kennedy, A. Markwitz, S.G. Telfer, G.B. Jameson, and J.L. Tallon Chem. Commun. 46 2010 4261
23. A. Markwitz, and J. Kennedy Int. J. Nanotechnol. 6 2009 369
24. B. Lucas, B. Ratier, A. Moliton, J.P. Moliton Lepofi, T.F. Otero, C. Santamaria, E. Angulo, and J. Rodriguez Synth. Met. 55 1993 1459
25. J. Biersack Nucl. Instrum. Meth. B 27 1987 21
26. M. Salmon, A. Diaz, A. Logan, M. Krounbi, and J. Bargon Mol. Cryst. Liq. Cryst. 83 1982 265
27. J. Kennedy, A. Markwitz, H.J. Trodahl, B.J. Ruck, S.M. Durbin, and W. Gao J. Electron. Mater. 36 2007 472
28. L.R. Doolittle Nucl. Instrum. Meth. B 9 1985 344
29. J. Chan, Four Point Probe Manual, http://physlab.lums.edu.pk/images/c/c6/ Four-point-probe.pdf (accessed 29.11.11).
30. H.T. Lee, Y.C. Liu, and L.H. Lin J. Polym. Sci. Polym. Chem. 44 2006 2724
31. Y. Furukawa, S. Tazawa, Y. Fujii, and I. Harada Synth. Met. 24 1988 329
32. K. Yakushi, L.J. Lauchlan, T.C. Clarke, and G.B. Street J. Chem. Phys. 79 1983 4774
33. J. Bredas, J. Scott, K. Yakushi, and G. Street Phys. Rev. B 30 1984 1023
34. J. Duchet, R. Legras, and S. Demoustier-Champagne Synth. Met. 98 1998 113
35. J. Leveneur, G.I.N. Waterhouse, J.V. Kennedy, J.B. Metson, and D.R.G. Mitchell J. Phys. Chem. C 115 2011 20978
36. C. Malitesta, I. Losito, L. Sabbatini, and P. Zambonin J. Electron. Spectrosc. 76 1995 629
37. C.C. Hu, and X.X. Lin J. Electrochem. Soc. 149 2002 A1049
38. R. Rajagopalan, and J.O. Iroh Appl. Surf. Sci. 218 2003 58
39. H. Ge, G. Qi, E.T. Kang, and K.G. Neoh Polymer 35 1994 504
40. P. Veluchamy, and H. Minoura Appl. Surf. Sci. 126 1998 241
41. D.O. Scanlon, A.B. Kehoe, G.W. Watson, M.O. Jones, W.I.F. David, D.J. Payne, R.G. Egdell, P.P. Edwards, and A. Walsh Phys. Rev. Lett. 107 2011 246402
42. S. Ellis, N. Hampson, M. Ball, and F. Wilkinson J. Appl. Electrochem. 16 1986 159
43. S.Y. Chu, P.A. Kilmartin, S. Jing, G.A. Bowmaker, R.P. Cooney, and J. Travas-Sejdic Synth. Met. 158 2008 38
44. P. Rapta, A. Neudeck, A. Petr, and L. Dunsch J. Chem. Soc. Faraday Trans. 94 1998 3625
45. M.C. Henry, C.C. Hsueh, B.P. Timko, and M.S. Freund J. Electrochem. Soc. 148 2001 D155
46. R. Čabala, J. Škarda, and K. Potje-Kamloth Phys. Chem. Chem. Phys. 2 2000 3283