SCOPUS 정보 검색 플랫폼

RSC Advances

Volumn 2, Issue 27, 2012, Pages 10209-10216

Interactive metal ion-silicon oxidation/reduction processes on fumed silica

(5) Wang, J a Mao, B a White, M G b Burda, C a Gole, J L c

a CASE WESTERN RESERVE UNIVERSITY (United States)

b MISSISSIPPI STATE UNIVERSITY (United States)

c GEORGIA INSTITUTE OF TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICA; AXIAL POSITIONS; COPPER CATALYST; CU/SILICA; DRY METHANOL; FE DOPING; FTIR; FUMED SILICAS; HYDRATED COPPER; IRON CHLORIDES; IRON NITRATES; METAL ELEMENTS; METAL ION OXIDATIONS; METAL OXIDATION; METAL OXIDES; OXIDATION STATE; PHENANTHROLINES; POST-SYNTHESIS TREATMENT; ROOM TEMPERATURE; SI IONS; SILICON ION; SILICON SURFACES; THEORETICAL PREDICTION; TRANSMISSION ELECTRON MICROSCOPY TEM; UV-VIS DIFFUSE REFLECTANCE SPECTROSCOPY; WATER CONTACT ANGLE;

CHLORINE COMPOUNDS; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IRON COMPOUNDS; METAL IONS; METHANOL; OXIDATION; PHOTOELECTRONS; SILICA; SILICON; SILICON OXIDES; SURFACE REACTIONS; TRANSITION METALS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACE STATES;

EID: 84867372797 PISSN: None EISSN: 20462069 Source Type: Journal
DOI: 10.1039/c2ra20580g Document Type: Article

Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.