Nucleation and growth of CVD α-Al 2O 3 on Ti xO y template

Surface and Coatings Technology

Volumn 207, Issue , 2012, Pages 254-261

  Fallqvist, M ^a   Ruppi, S ^b   Olsson, M ^a   Ottosson, M ^c   Grehk, T M ^a  

^a DALARNA UNIVERSITY   (Sweden)

^b Walter AG   (Germany)

^c UPPSALA UNIVERSITY   (Sweden)

Author keywords

Al 2O 3; Adhesion; CVD; Nucleation; Template

Indexed keywords

ADHESIVE STRENGTH; CEMENTED CARBIDES; CHEMICAL COMPOSITIONS; INTERFACIAL LAYER; INTERFACIAL STRENGTH; MULTILAYER STRUCTURES; NUCLEATION AND GROWTH; SURFACE ANALYSIS TECHNIQUES; TEMPLATE; TI (C ,N); TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; TRACE ELEMENT ANALYSIS;

ADHESION; AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SURFACE ANALYSIS; X RAY DIFFRACTION;

ALUMINUM;

EID: 84865784321     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.06.087     Document Type: Article

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