P-type behaviour of electrodeposited ZnO:Cu films

Journal of Solid State Electrochemistry

Volumn 16, Issue 6, 2012, Pages 2261-2265

  Marí, Bernabé ^a   Sahal, Mustapha ^a   Mollar, Miguel A ^a   Cerqueira, Fatima M ^b   Samantilleke, Anura P ^b  

^a UNIVERSITAT POLITÈCNICA DE VALÈNCIA   (Spain)

^b UNIVERSITY OF MINHO   (Portugal)

Author keywords

Electrodeposition; P type; Photocurrent; ZnO homojunction; ZnO:Cu

Indexed keywords

CONDUCTIVE GLASS; CU CONTENT; CU-DOPED ZNO; HEXAGONAL WURTZITE STRUCTURE; HOMOJUNCTION; NON-AQUEOUS ELECTROLYTES; P-TYPE; P-TYPE CONDUCTIVITY; PRECURSOR RATIOS; PREFERRED ORIENTATIONS; RECTIFYING CHARACTERISTICS; ZNO;

ELECTRODEPOSITION; ELECTROLYTES; METALLIC FILMS; PHOTOCURRENTS; SUBSTRATES; ZINC; ZINC OXIDE; ZINC SULFIDE;

COPPER;

EID: 84865518914     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-011-1635-x     Document Type: Article

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