Influence of thermal annealing on structural and electrical properties of nickel oxide thin films

Journal of Nano- and Electronic Physics

Volumn 3, Issue 1 PART2, 2011, Pages 225-231

  Mallikarjuna Reddy, A ^a   Seshendra Reddy, Ch ^a   Sivasankar Reddy, A ^b   Sreedhara Reddy, P ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b Kongju National University   (South Korea)

Author keywords

Annealing temperature; Electrical properties; Sputtering; Structural properties

Indexed keywords

EID: 84865120554     PISSN: 20776772     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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