Photomanipulation of antibiotic susceptibility and biofilm formation of Escherichia coli heterologously expressing photoactivated adenylyl cyclase

Journal of General and Applied Microbiology

Volumn 58, Issue 3, 2012, Pages 183-190

  Yasukawa, Hiro ^a   Konno, Noriko ^a   Haneda, Yukari ^a   Yamamori, Baku ^a   Iseki, Mineo ^b   Shibusawa, Mami ^c   Ono, Yasushi ^a   Kodaira, Kenichi ^a   Funada, Hisashi ^d   Watanabe, Masakatsu ^e  

^a UNIVERSITY OF TOYAMA   (Japan)

^b TOHO UNIVERSITY   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

^d UNIVERSITY OF TOYAMA   (Japan)

^e GRADUATE SCHOOL FOR THE CREATION OF NEW PHOTONICS INDUSTRIES   (Japan)

Author keywords

Antibiotics; Biofilm; cAMP; Escherichia coil; Photomanipulation

Indexed keywords

ADENYLATE CYCLASE; CYCLIC AMP; FOSFOMYCIN; LEVOFLOXACIN; NALIDIXIC ACID; NORFLOXACIN; STREPTOMYCIN; TOBRAMYCIN;

ANTIBIOTIC SENSITIVITY; ARTICLE; BACTERIAL CELL; BACTERIAL MEMBRANE; BACTERIAL STRAIN; BACTERIUM CULTURE; BIOFILM; ESCHERICHIA COLI; MEMBRANE FORMATION; MUTATIONAL ANALYSIS; NONHUMAN; NUCLEOTIDE SEQUENCE; PHOTOACTIVATION; PHOTOSTIMULATION; PROTEIN EXPRESSION;

ADENYLATE CYCLASE; ANTI-BACTERIAL AGENTS; BEGGIATOA; BIOFILMS; DARKNESS; DRUG RESISTANCE, BACTERIAL; ESCHERICHIA COLI; FOSFOMYCIN; GENE EXPRESSION REGULATION, BACTERIAL; GENETIC VECTORS; LIGHT; METABOLIC ENGINEERING; MICROBIAL SENSITIVITY TESTS; NALIDIXIC ACID; PLASMIDS; STREPTOMYCIN; TRANSCRIPTIONAL ACTIVATION; TRANSFORMATION, BACTERIAL;

EID: 84865084487     PISSN: 00221260     EISSN: 13498037     Source Type: Journal    
DOI: 10.2323/jgam.58.183     Document Type: Article

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