Electrochemical impedance studies of the growth of sulfide films on copper

17th International Corrosion Congress 2008: Corrosion Control in the Service of Society

Volumn 2, Issue , 2008, Pages 1316-1324

  Smith, J M ^a,b   Qin, Z ^a   Shoesmith, D W ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b KINECTRICS INC   (Canada)

Author keywords

Copper; Corrosion; EIS; Impedance; Sulfide film

Indexed keywords

ANOXIC ENVIRONMENT; CHLORIDE SOLUTIONS; COPPER CONTAINERS; CORROSION POTENTIALS; EIS; ELECTROCHEMICAL IMPEDANCE; FINLAND; GRANITE ROCK; INTERFACIAL STRESS; ION TRANSPORTS; POSITIVE POTENTIAL; SULFIDE CONCENTRATION; SULFIDE FILMS; TIME CONSTANTS; TRANSPORT PROCESS;

CHLORINE COMPOUNDS; COPPER; CORROSION; CORROSION PREVENTION; ELECTRIC IMPEDANCE; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; FILM GROWTH; FRACTURE; RADIOACTIVE WASTE DISPOSAL; SULFUR COMPOUNDS;

ELECTROCHEMICAL CORROSION;

EID: 84865041070     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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