Determination of solvation layer thickness by a magnetophotonic approach

ACS Nano

Volumn 6, Issue 5, 2012, Pages 4196-4202

  He, Le ^a   Hu, Yongxing ^a   Wang, Mingsheng ^a   Yin, Yadong ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Colloids; Diffraction; Electrostatic interaction; Magnetic nanoparticles; Repulsion; Silica; Solvation layer

Indexed keywords

AQUEOUS SUSPENSIONS; COLLOID PARTICLES; COLLOIDAL PARTICLE; COLLOIDAL SILICA SURFACE; DERJAGUIN-LANDAU-VERWEY-OVERBEEK THEORIES; HIGH IONIC STRENGTH; INTERPARTICLE DISTANCES; MAGNETIC NANOPARTICLES; POLAR SOLVENTS; REPULSION; REPULSIVE INTERACTIONS; SOLVATION FORCES; SOLVATION LAYERS; SOLVENT MOLECULES;

COLLOIDS; COULOMB INTERACTIONS; DIFFRACTION; HYDROGEN; IONIC STRENGTH; SILICA; SOLVATION;

SUSPENSIONS (FLUIDS);

EID: 84864710514     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn3007288     Document Type: Article

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