SCOPUS 정보 검색 플랫폼

Soft Matter

Volumn 8, Issue 23, 2012, Pages 6226-6231

Design of patchy particles using ternary self-assembled monolayers

(2) Pons Siepermann, Inés C a Glotzer, Sharon C a

a UNIVERSITY OF MICHIGAN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMATIONAL ENTROPY; DESIGN ELEMENTS; DISSIPATIVE PARTICLE DYNAMICS; FREE ENERGY MINIMIZATION; LENGTH DIFFERENCE; NANOCOLLOID; PATCHY PARTICLES; PATTERN FORMATION; SPHERICAL NANOPARTICLES;

BINARY MIXTURES; SELF ASSEMBLED MONOLAYERS; STOICHIOMETRY;

SURFACE ACTIVE AGENTS;

EID: 84864500257 PISSN: 1744683X EISSN: 17446848 Source Type: Journal
DOI: 10.1039/c2sm00014h Document Type: Article

Times cited : (39)

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