Galvanostatic deposition of ZnO thin films

Electrochimica Acta

Volumn 78, Issue , 2012, Pages 547-556

  Salazar, Raul ^a   Lévy Clément, Claude ^b   Ivanova, Valentina ^a  

^a CEA LETI   (France)

^b CNRS Université Paris Est Créteil Val de Marne   (France)

Author keywords

Galvanostatic deposition; Nanostructured solar cells; Photovoltaic; ZnO

Indexed keywords

2D LAYER; AQUEOUS CHLORIDE; BATH TEMPERATURES; DEPOSITION CONDITIONS; DEPOSITION CURRENT DENSITY; DEPOSITION TEMPERATURES; ELECTRODE PASSIVATION; FILM COMPOSITION; GALVANOSTATIC DEPOSITION; HIGH TEMPERATURE; NANOSTRUCTURED SOLAR CELLS; OTHER OPTO-ELECTRONIC DEVICES; PHOTOVOLTAIC; SEED LAYER THICKNESS; SMALL GRAINS; SUPPORTING ELECTROLYTE; ZINC OXIDE (ZNO); ZNO; ZNO NANOWIRES; ZNO THIN FILM;

CHLORINE COMPOUNDS; D REGION; ELECTROLYTES; METALLIC FILMS; MORPHOLOGY; NANOWIRES; OPTICAL FILMS; OPTICAL PROPERTIES; OPTOELECTRONIC DEVICES; SOLAR CELLS; THIN FILMS; VAPOR DEPOSITION;

ZINC OXIDE;

EID: 84864276982     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2012.06.070     Document Type: Article

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