Influence of oxygen vacancies on the electronic structure and magnetic properties of NiFe 2O 4 thin films

Journal of Applied Physics

Volumn 111, Issue 9, 2012, Pages

  Jaffari, G Hassnain ^a,b   Rumaiz, A K ^c   Woicik, J C ^d   Shah, S Ismat ^a  

^a UNIVERSITY OF DELAWARE   (United States)

^b QUAID I AZAM UNIVERSITY   (Pakistan)

^c BROOKHAVEN NATIONAL LABORATORY   (United States)

^d NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED FIELD; BULK COUNTERPART; BULK SAMPLES; COOLING FIELDS; EXCHANGE BIAS; EXCHANGE COUPLED; GLASSY STATE; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; INFLUENCE OF OXYGEN; LOW FIELD; MAGNETIC IRREVERSIBILITY; NICKEL FERRITE; NON-STOICHIOMETRY; PULSE LASER DEPOSITION; RANDOM ANISOTROPY; ROOM TEMPERATURE; SPIN-CANTING; SPIN-FREEZING TEMPERATURE; SUPEREXCHANGE INTERACTION;

DEPOSITION; ELECTRONIC STRUCTURE; MAGNETIC PROPERTIES; OXYGEN VACANCIES; PHOTOELECTRONS; SATURATION MAGNETIZATION; SPIN GLASS; STOICHIOMETRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

VAPOR DEPOSITION;

EID: 84864262182     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4704690     Document Type: Article

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