Pulsed laser deposition of NiFe 2O 4 thin films

Journal of Optoelectronics and Advanced Materials

Volumn 6, Issue 3, 2004, Pages 935-938

  Caltun, O F ^a,b  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

^b Changhua University   (Taiwan)

Author keywords

Magnetic properties; NiFe 2O 4 thin film; Post annealing; Pulsed laser deposition

Indexed keywords

BULK FERRITES; NIFE2O4 THIN FILMS; POST ANNEALING;

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; ENERGY DISPERSIVE SPECTROSCOPY; FERRITE; NICKEL; OXYGEN; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

MAGNETIC THIN FILMS;

EID: 5044227854     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (16)

1. M. Nakano, K. Tomohara, J. M. Song, H. Fukunaga, J. Appl. Phys. 87 (9), 6217 (2000).
2. A. E. Berkovitz, J. A. Lathut, I. S. Jacobs, L. M. Levison, D. W. Forester, Phys. Rev. Lett. 54, 594 (1975).
3. D. T. Margulies, F. T. Parker, F. E. Spada, A. E. Berkovitz, Mater. Res. Soc. Symp. Proc. 341, 53 (1994).
4. R. B. van Dover, S. Venzke, E, M. Gyorgy, J. M. Philips, J. H. Marshall, R. J. Felder, Mater. Res. Soc. Symp. Proc. 341 41 (1994).
5. V. Korenivski, R.B. van Dover, Y. Suzuki, E. M. Gyorgy, J. M. Philips, R. J. Felder, J. Appl. Phys. 79 (8) 5926 (1996)
6. N. Blombergen, Laser ablation mechanism and Applications II, Second International Conference Knoxville, April 1993, Ed. by John C. Miller and David B. Geohegan, AIP New York, 1994.
7. Pulsed laser deposition of thin films, ed. by Douglas B. Chrisey and Graham K. Hubler, John Willey & Sons, Inc. New York (1994).
8. N. Keller, M. Guyot, A. Das, A. Porte, R. Krishnan, IEEE Trans. Magn. 34, 837 (1998).
9. R. Krishnan, J. Appl. Phys. 85(8), 5771 (1999).
10. B. Negulescu, L. Thomas, Y. Dumont, M. Tessier, N. Keller, M. Guyot, J. Magn, Magn, Mat., 242-245, 529, (2002).
11. R. B. van Dover, E. M. Gyorgy, S. Venzke, J. M. Philips, J. H. Marshall, R. J. Felder, R.M. Fleming, H. O'Bryan, Jr. J. Appl. Phys. 75,612 (1994).
12. Hae Soek Cho, Sang Ki Ha, Min Hong Kim, Hyeong Joon Kim, J. Mater. Res. 10 274 (1995).
13. P. Samarashekara, R. Rani, F. J. Cadieu, S. A. Shaheen, J. Appl. Phys. 79(8), 5425 (1996).
14. R. Swanepoel, J. Phys E: Sci. Instrum. 16,1214 (1983).
15. D. Mardare, A. Stancu, Mat. Res. Bull. 35, 2017 (2000).
16. C. C. Ting, S. Y. Chen, J. Appl. Phys. 88, 4628 (2000).