Field emission in lateral silicon diode fabricated by atomic force microscopy lithography

Electronics Letters

Volumn 48, Issue 12, 2012, Pages 712-714

  Rouhi, J ^a   Mahmud, S ^a   Hutagalung, S D ^b   Naderi, N ^a  

^a SCHOOL OF PHYSICS   (Malaysia)

^b SCHOOL OF MATERIALS AND MINERAL RESOURCES ENGINEERING   (Malaysia)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY LITHOGRAPHY; EMITTING AREAS; FIELD EMISSION DIODE; FIELD ENHANCEMENT FACTOR; FOWLER-NORDHEIM; GAP WIDTHS; HIGH EMISSION CURRENT; SILICON DIODES; SMOOTH SURFACE;

ATOMIC FORCE MICROSCOPY; DIODES; FIELD EMISSION;

FIELD EMISSION CATHODES;

EID: 84864214857     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el.2012.1020     Document Type: Article

References (6)

1. Singh, A.K., Rajput, N.S., Banerjee, A., Kulkarni, V.N., and Kumar, J.: ' P 1-18: IV characteristics of nanogap electrodes formed by thermally assisted electromigration ', Int. Conf. on Vacuum Nanoelectronics, Palo Alto, CA, USA, July, 2010, p. 64
2. Milne, W., Teo, K., Amaratunga, G., Legagneux, P., Gangloff, L., Schnell, J.P., Semet, V., Binh, V.T., and Groening, O.: ' Carbon nanotubes as field emission sources ', J. Mater. Chem., 2004, 14, (6), p. 933-943 10.1039/b314155c
3. Milne, W., Teo, K., Mann, M., Bu, I., Amaratunga, G., De Jonge, N., Allioux, M., Oostveen, J., Legagneux, P., and Minoux, E.: ' Carbon nanotubes as electron sources ', Phys. Status Solidi A, 2006, 203, (6), p. 1058-1063 10.1002/pssa.200566101 0031-8965
4. Rouhi, J., Mahmud, S., Hutagalung, S.D., and Kakooei, S.: ' Fabrication of nanogap electrodes via nano-oxidation mask by scanning probe microscopy nanolithography ', J. Micro/Nanolithography, MEMS, MOEMS, 2011, 10, p. 043002 10.1117/1.3643480
5. Park, J.H., Lee, H.I., Tae, H.S., Huh, J.S., and Lee, J.H.: ' Lateral field emission diodes using SIMOX wafer ', IEEE Trans. Electron Devices, 1997, 44, p. 1018-1021 10.1109/16.585560 0018-9383
6. Shin, H., Yang, S., Hwang, T., Han, S., Lee, J., and Lee, Y.D.: ' Lateral silicon field emission devices using electron beam lithography ', Jpn. J. Appl. Phys., 2000, 39, p. 2556-2559 10.1143/JJAP.39.2556 0021-4922