Visible light-induced photocatalytic properties of WO 3 films deposited by dc reactive magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 3, 2012, Pages

  Imai, Masahiro ^a   Kikuchi, Maiko ^a   Oka, Nobuto ^a   Shigesato, Yuzo ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION RATIO; CRYSTALLINITIES; DC REACTIVE MAGNETRON SPUTTERING; FILM SURFACES; FUSED QUARTZ; GAS PRESSURES; LARGE SURFACE AREA; METAL TARGET; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC DECOMPOSITION; PHOTOCATALYTIC PROPERTY;

ACETALDEHYDE; ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; PHOTOCATALYSIS; PHOTOCATALYSTS; QUARTZ; SCANNING ELECTRON MICROSCOPY; TUNGSTEN; X RAY DIFFRACTION;

CARBON DIOXIDE;

EID: 84864185965     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3696876     Document Type: Article

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