-
1
-
-
77955320186
-
-
10.1021/nl101322h
-
J. A. Chang, J. H. Rhee, S. H. Im, Y. H. Lee, H. J. Kim, S. I. Seok, M. K. Nazeeruddin, and M. Gratzel, Nano Lett. 10, 2609 (2010). 10.1021/nl101322h
-
(2010)
Nano Lett.
, vol.10
, pp. 2609
-
-
Chang, J.A.1
Rhee, J.H.2
Im, S.H.3
Lee, Y.H.4
Kim, H.J.5
Seok, S.I.6
Nazeeruddin, M.K.7
Gratzel, M.8
-
2
-
-
64749115998
-
-
10.1021/jp900302b
-
Y. Itzhaik, O. Niitsoo, M. Page, and G. Hodes, J. Phys. Chem. C 113, 4254 (2009). 10.1021/jp900302b
-
(2009)
J. Phys. Chem. C
, vol.113
, pp. 4254
-
-
Itzhaik, Y.1
Niitsoo, O.2
Page, M.3
Hodes, G.4
-
3
-
-
77952702715
-
-
10.1021/jz100308q
-
S. J. Moon, Y. Itzhaik, J. H. Yum, S. M. Zakeeruddin, G. Hodes, and M. Gratzel, J. Phys. Chem. Lett. 1, 1524 (2010). 10.1021/jz100308q
-
(2010)
J. Phys. Chem. Lett.
, vol.1
, pp. 1524
-
-
Moon, S.J.1
Itzhaik, Y.2
Yum, J.H.3
Zakeeruddin, S.M.4
Hodes, G.5
Gratzel, M.6
-
4
-
-
77951080761
-
-
10.1021/jp100401e
-
S. Nezu, G. Larramona, C. Chone, A. Jacob, B. Delatouche, D. Pere, and C. Moisan, J. Phys. Chem. C 114, 6854 (2010). 10.1021/jp100401e
-
(2010)
J. Phys. Chem. C
, vol.114
, pp. 6854
-
-
Nezu, S.1
Larramona, G.2
Chone, C.3
Jacob, A.4
Delatouche, B.5
Pere, D.6
Moisan, C.7
-
5
-
-
84863184175
-
-
10.1039/c2cc17573h
-
J. C. Cardoso, C. A. Grimes, X. J. Feng, X. Y. Zhang, S. Komarneni, M. V. B. Zanoni, and N. Z. Bao, Chem. Commun. 48, 2818 (2012). 10.1039/c2cc17573h
-
(2012)
Chem. Commun.
, vol.48
, pp. 2818
-
-
Cardoso, J.C.1
Grimes, C.A.2
Feng, X.J.3
Zhang, X.Y.4
Komarneni, S.5
Zanoni, M.V.B.6
Bao, N.Z.7
-
6
-
-
84855902782
-
-
10.1021/jp210002c
-
P. P. Boix, G. Larramona, A. Jacob, B. Delatouche, I. M. Seró, and J. Bisquert, J. Phys. Chem. C 116, 1579 (2012). 10.1021/jp210002c
-
(2012)
J. Phys. Chem. C
, vol.116
, pp. 1579
-
-
Boix, P.P.1
Larramona, G.2
Jacob, A.3
Delatouche, B.4
Seró, I.M.5
Bisquert, J.6
-
9
-
-
69249213906
-
-
10.1038/nmat2493
-
Z. Y. Fan, H. Razavi, J. W. Do, A. Moriwaki, O. Ergen, Y. L. Chueh, P. W. Leu, J. C. Ho, T. Takahashi, L. A. Reichertz, S. Neale, K. Yu, M. Wu, J. W. Ager, and A. Javey, Nature Mater. 8, 648 (2009). 10.1038/nmat2493
-
(2009)
Nature Mater.
, vol.8
, pp. 648
-
-
Fan, Z.Y.1
Razavi, H.2
Do, J.W.3
Moriwaki, A.4
Ergen, O.5
Chueh, Y.L.6
Leu, P.W.7
Ho, J.C.8
Takahashi, T.9
Reichertz, L.A.10
Neale, S.11
Yu, K.12
Wu, M.13
Ager, J.W.14
Javey, A.15
-
10
-
-
78449272437
-
-
10.1021/nl102867a
-
Y. Lu and A. Lal, Nano Lett. 10, 4651 (2010). 10.1021/nl102867a
-
(2010)
Nano Lett.
, vol.10
, pp. 4651
-
-
Lu, Y.1
Lal, A.2
-
11
-
-
42349109415
-
-
10.1063/1.2909576
-
D. Kieven, T. Dittrich, A. Belaidi, J. Tornow, K. Schwarzburg, N. Allsop, and M. L. Steiner, Appl. Phys. Lett. 92, 153107 (2008). 10.1063/1.2909576
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 153107
-
-
Kieven, D.1
Dittrich, T.2
Belaidi, A.3
Tornow, J.4
Schwarzburg, K.5
Allsop, N.6
Steiner, M.L.7
-
12
-
-
76449094855
-
-
10.1063/1.3299269
-
Y. H. Leung, Z. B. He, L. B. Luo, C. H. A. Tsang, N. B. Wong, W. J. Zhang, and S. T. Lee, Appl. Phys. Lett. 96, 053102 (2010). 10.1063/1.3299269
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 053102
-
-
Leung, Y.H.1
He, Z.B.2
Luo, L.B.3
Tsang, C.H.A.4
Wong, N.B.5
Zhang, W.J.6
Lee, S.T.7
-
13
-
-
0041305911
-
-
10.1002/anie.200351461
-
L. E. Greene, M. Law, J. Goldberger, F. Kim, J. C. Johnson, Y. F. Zhang, R. J. Saykally, and P. D. Yang, Angew. Chem. Int. Ed. 42, 3031 (2003). 10.1002/anie.200351461
-
(2003)
Angew. Chem. Int. Ed.
, vol.42
, pp. 3031
-
-
Greene, L.E.1
Law, M.2
Goldberger, J.3
Kim, F.4
Johnson, J.C.5
Zhang, Y.F.6
Saykally, R.J.7
Yang, P.D.8
-
14
-
-
36549090980
-
-
10.1063/1.341843
-
P. J. McElheny, J. K. Arch, H. S. Lin, and S. J. Fonash, J. Appl. Phys. 64, 1254 (1988). 10.1063/1.341843
-
(1988)
J. Appl. Phys.
, vol.64
, pp. 1254
-
-
McElheny, P.J.1
Arch, J.K.2
Lin, H.S.3
Fonash, S.J.4
-
15
-
-
77951177331
-
-
10.1063/1.3383232
-
J. Cuiffi, T. Benanti, W. J. Nam, and S. Fonash, Appl. Phys. Lett. 96, 143307 (2010). 10.1063/1.3383232
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 143307
-
-
Cuiffi, J.1
Benanti, T.2
Nam, W.J.3
Fonash, S.4
-
16
-
-
84863135701
-
-
10.1002/pssb.201147393
-
C. P. Liu, H. E. Wang, T. W. Ng, Z. H. Chen, W. F. Zhang, C. Yan, Y. B. Tang, I. Bello, L. Martinu, W. J. Zhang, and S. K. Jha, Phys. Status Solidi B 249, 627 (2012). 10.1002/pssb.201147393
-
(2012)
Phys. Status Solidi B
, vol.249
, pp. 627
-
-
Liu, C.P.1
Wang, H.E.2
Ng, T.W.3
Chen, Z.H.4
Zhang, W.F.5
Yan, C.6
Tang, Y.B.7
Bello, I.8
Martinu, L.9
Zhang, W.J.10
Jha, S.K.11
-
20
-
-
84863306631
-
-
See supplementary material at E-APPLAB-100-002225 for surface morphologies of both ZnO seed layer and the Sb2S3, and for AMPS simulation parameters of control device.
-
See supplementary material at http://dx.doi.org/10.1063/1.4728985 E-APPLAB-100-002225 for surface morphologies of both ZnO seed layer and the Sb2S3, and for AMPS simulation parameters of control device.
-
-
-
-
21
-
-
80955144235
-
-
10.1007/s12274-011-0160-7
-
S. Xu and Z. L. Wang, Nano Res. 4, 1013 (2011). 10.1007/s12274-011-0160-7
-
(2011)
Nano Res.
, vol.4
, pp. 1013
-
-
Xu, S.1
Wang, Z.L.2
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