Electrochemical oxidation of aqueous phenol at low concentration using Ti/BDD electrode

Separation and Purification Technology

Volumn 88, Issue , 2012, Pages 116-120

  Sun, Jianrui ^a   Lu, Haiyan ^a   Lin, Haibo ^a   Du, Lili ^a   Huang, Weimin ^a   Li, Hongdong ^a   Cui, Tian ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

Boron doped diamond; Electrooxidation; Fluorine doped lead dioxide; Low concentration; Preparation

Indexed keywords

AQUEOUS PHENOLS; BDD ELECTRODES; BORON DOPED DIAMOND; BORON-DOPED DIAMOND FILMS; CURRENT EFFICIENCY; DILUTE SOLUTION; ELECTROCATALYTIC ACTIVITY; ELECTROCHEMICAL WINDOW; FLUORINE-DOPED; HIGH QUALITY; LEAD DIOXIDE; LINEAR SWEEP VOLTAMMETRY; LOW BACKGROUND; LOW CONCENTRATIONS; LOWER-POWER CONSUMPTION; MICROWAVE PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION; OXIDATION PEAK; PREPARATION; TI SUBSTRATES;

ANODES; BIODEGRADATION; BORON; CHEMICAL VAPOR DEPOSITION; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL OXIDATION; ELECTROOXIDATION; FLUIDIZED BED COMBUSTION; FLUORINE; LEAD OXIDE; PHENOLS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY;

ELECTRIC DISCHARGES;

EID: 84863259008     PISSN: 13835866     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.seppur.2011.12.022     Document Type: Article

References (22)

1. X.L. Qiao, Z. Liu, Z.W. Liu, Y.L. Zeng, and Z.J. Zhang Biochem. Eng. J. 50 2010 71 76
2. C. Flox, C. Arias, E. Brillas, A. Savall, and K. Groenen-Serrano Chemosphere 74 2009 1340 1347
3. Y.M. Awad, and N.S. Abuzaid Sep. Sci. Technol. 34 1999 699 708
4. G.H. Chen Sep. Purif. Technol. 38 2004 11 41
5. S. Abaci, U. Tamer, K. Pekmez, and A. Yildiz Appl. Surf. Sci. 240 2005 112 119
6. C.A. artínez-Huitle, M.A. Quiroz, Ch. Comninellis, and S. Ferro Electrochim. Acta 50 2004 949 956
7. M. Panizza, A. Barbucci, R. Ricotti, and G. Cerisola Sep. Purif. Technol. 54 2007 382 387
8. G. Zhao, S. Shen, M. Li, M. Wu, T. Cao, and D. Li Chemosphere 73 2008 1407 1413
9. N. Borràs, R. Oliver, C. Arias, and E. Brillas J. Phys. Chem. A 114 2010 6613 6621
10. X.M. Chen, G.H. Chen, and P.L. Yue Chem. Eng. Sci. 58 2003 995 1001
11. X.M. Chen, and G.H. Chen Sep. Purif. Technol. 48 2006 45 49
12. M.H. Zhou, H. Sarkka, and M. Sillanpaa Sep. Purif. Technol. 78 2011 290 297
13. M.J. Pacheco, V. Santos, L. Ciríaco, and A. Lopes J. Hazard. Mater. 186 2011 1033 1041
14. C.A. Martinez-Huitle, M.A. Quiroz, C. Comninellisc, S. Ferro, and A.D. Battisti Electrochim. Acta 50 2004 949 956
15. C.Y. Gao, and M. Chang Acta Phys. Chim. Sin. 24 2008 1988 1994
16. X.H. Mao, F. Tian, F.X. Gan, A. Lin, and X.J. Zhang Russ. J. Electrochem. 44 2008 802 811
17. C.H. Goeting, J.S. Foord, F. Marken, and R.G. Compton Diam. Relat. Mater. 8 1999 824 829
18. I. Gerger, R. Haubner, H. Kronberger, and G. Fafilek Diam. Relat. Mater. 13 2004 1062 1069
19. P. Cañizares, C. Sáez, F. Martínez, and M.A. Rodrigo Electrochem. Solid State Lett. 11 2008 E15 E19
20. H.D. Li, T. Zhang, L.A. Li, X.Y. Lv, B. Li, Z.S. Jin, and G.T. Zou J. Cryst. Growth 312 2010 1986 1991
21. R. Torz-Piotrowska, A. Wrzyszczyński, K. Paprocki, and E. Staryga Opt. Mater. 31 2009 1870 1872
22. Y. Gurbuz, W.P. Kang, J.L. Davidson, and D.V. Kerns Sensor. Actuat. B-Chem. 49 1998 115 120