Optimized molecular structure of photoreactive biocompatible block copolymers for surface modification of metal substrates

ACS Applied Materials and Interfaces

Volumn 4, Issue 6, 2012, Pages 3254-3260

  Iwasaki, Yasuhiko ^a   Matsumoto, Akira ^a   Yusa, Shin Ichi ^b  

^a KANSAI UNIVERSITY   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

block copolymer; cell adhesion; MPC polymer; nonfouling; RAFT polymerization; surface modification

Indexed keywords

2-METHACRYLOYLOXYETHYL PHOSPHORYLCHOLINE; CELL CULTIVATION; CONTROLLED RADICAL POLYMERIZATION; FIBROBLAST ADHESION; IMMOBILIZED LAYERS; METAL SUBSTRATE; METAL SURFACES; MPC POLYMER; NONFOULING; RAFT POLYMERIZATION; REVERSIBLE ADDITION-FRAGMENTATION CHAIN TRANSFER; SERUM PROTEINS; SPECIMEN SURFACES; SURFACE DENSITY; SURFACE IMMOBILIZATION; SUS316L; UV IRRADIATION;

ADHESION; CELL ADHESION; CELL CULTURE; FREE RADICAL POLYMERIZATION; LIVING POLYMERIZATION; MOLECULAR WEIGHT; OPTIMIZATION; PHOTOELECTRONS; STAINLESS STEEL; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

BLOCK COPOLYMERS;

EID: 84863207125     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am3006065     Document Type: Article

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