Investigation of inner surface of silicon microchannels fabricated by electrochemical method

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 12, 2011, Pages 11045-11048

  Ci, Pengliang ^a   Shi, Jing ^a   Sun, Li ^a   Liu, Tao ^a   Wang, Lianwei ^a   Chu, Paul K ^b  

^a EAST CHINA NORMAL UNIVERSITY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Carbon nanotubes; Electron emission; Microchannels; Silicon based; Surface morphology

Indexed keywords

ELECTROCHEMICAL METHODS; ETCHANT CONCENTRATIONS; INNER SURFACES; INTERNAL PORES; METALLIC CATALYSTS; PORE WALL; REGULAR STRUCTURE; SILICON MICROCHANNELS; SILICON-BASED; THERMAL CHEMICAL VAPOR DEPOSITION;

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; ELECTRON EMISSION; FABRICATION; HYDROFLUORIC ACID; MORPHOLOGY; PORE PRESSURE; QUAY WALLS; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY;

MICROCHANNELS;

EID: 84863175981     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.4035     Document Type: Conference Paper

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