Pressure-dependent variable resistors based on porous polymeric foams with conducting polymer thin films in situ coated on the interior surfaces

Proceedings of Technical Papers - International Microsystems, Packaging, Assembly, and Circuits Technology Conference, IMPACT

Volumn , Issue , 2011, Pages 63-66

  Wang, Pen Cheng ^a   Lin, Wei Keng ^a   Hung, Sz Yuan ^a   Lu, Hsueh Ju ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM PEROXYDISULFATE; APPLIED PRESSURE; CAMPHORSULFONIC ACID; CONDUCTIVE COMPOSITES; CYCLING TESTS; DEPOSITION PROCESS; IN-SITU; INTERIOR SURFACES; INTERSTITIAL SPACE; LINEAR RESPONSE RANGE; MECHANICAL BUFFERS; MONOMER SOLUTIONS; OXIDATIVE CHEMICALS; PEDOT:PSS; PLASTIC ELECTRODES; POLY(3 ,4-ETHYLENEDIOXYTHIOPHENE); POLY(STYRENE SULFONATE); POLYMERIC FOAMS; POLYURETHANE FOAMS; PRESSURE DEVICES; REPRODUCIBILITIES; VARIABLE RESISTORS;

AMMONIUM COMPOUNDS; ANILINE; DEPOSITION; MICROSYSTEMS; NANOCOMPOSITE FILMS; OPTICAL MICROSCOPY; PLASTIC COATINGS; POLYANILINE; POLYETHYLENE TEREPHTHALATES; PRESSURE SENSORS; RESISTORS;

FOAMS;

EID: 84863160690     PISSN: 21505934     EISSN: 21505942     Source Type: Conference Proceeding    
DOI: 10.1109/IMPACT.2011.6117274     Document Type: Conference Paper

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