Control of the preferred orientation of Cu(In,Ga)Se 2 thin film by the surface modification of Mo film

Journal of the Electrochemical Society

Volumn 159, Issue 1, 2012, Pages

  Shin, Dong Hyeop ^a   Shin, Young Min ^a   Kim, Ji Hye ^a   Ahn, Byung Tae ^a   Yoon, Kyung Hoon ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Institute of Energy Research (KIER)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CIGS FILMS; CIGS SOLAR CELLS; CIGS THIN FILMS; CO-EVAPORATIONS; CU(IN , GA)SE; DEPOSITION PRESSURES; ORIENTATION CONTROL; PRE-TREATMENT; PREFERRED ORIENTATIONS; SPUTTERING PROCESS;

CONVERSION EFFICIENCY; COPPER; GALLIUM; SURFACE MORPHOLOGY; THIN FILMS; VAPOR DEPOSITION; DEPOSITION; SPUTTERING;

SEMICONDUCTING SELENIUM COMPOUNDS;

EID: 84863147288     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/2.009201jes     Document Type: Article

References (14)

1. J. H. Scofield, A. Duda, D. Albin, B. L. Ballard, and P. K. Predecki, Thin Solid Films, 260, 26 (1995). 10.1016/0040-6090(94)06462-8
2. T. J. Vink, M. A. J. Somers, J. L. C. Daams, and A. G. Dirks, J. Appl. Phys., 70, 4301 (1991). 10.1063/1.349108
3. H. A. Al-Thani, F. S. Hasoon, J. L. Alleman, and M. M. Al-Jassim, Proceedings of Solar Energy Conf., Sharjah, UAE, (2001).
4. K. H. Yoon, S. K. Kim, R. B. V. Chalapathy, J. H. Yun, J. C. Lee, J. Song, and B. T. Ahn, J. Korean Phys. Soc., 45, 1114 (2004). 10.3938/jkps.45.1114
5. T. Wada, N. Kohara, T. Negami, and M. Nishitani, Jpn. J. Appl. Phys., 35, L1253 (1996). 10.1143/JJAP.35.L1253
6. N. Kohara, S. Nishiwaki, Y. Hashimoto, T. Negami, and T. Wada, Sol. Energy Mater. Sol. Cells, 67, 209 (2001). 10.1016/S0927-0248(00)00283-X (Pubitemid 32092026)
7. D. Abous-Ras, G. Kostorz, D. Bremaud, M. Klin, F. V. Kurdesau, A. N. Tiwari, and M. Dbeli, Thin Solid Films, 480-481, 433 (2005). 10.1016/j.tsf.2004.11.098 (Pubitemid 40643017)
8. S. H. Kwon, D. Y. Lee, B. T. Ahn, K. H. Yoon, and J. Song, J. Korean Phys. Soc., 39, 655 (2001). 10.3938/jkps.39.655
9. K. H. Kim, K. H. Yoon, J. H. Yun, and B. T. Ahn, Electrochem. Solid State Lett., 9, A382 (2006). 10.1149/1.2208011 (Pubitemid 43941616)
10. S. G. Malhotra, Z. U. Rek, S. M. Yalisove, and J. C. Bilello, Thin Solid Films, 301, 45 (1997). 10.1016/S0040-6090(96)09569-7
11. J. F. Guillemoles, L. Kronik, D. Cahen, U. Rau, A. Jasenek, and H. W. Schock, J. Phys. Chem. B, 104, 4849 (2000). 10.1021/jp993143k
12. M. A. Contreras, B. Egaas, D. King, A. Swartalander, and T. Dullweber, Thin Solid Films, 361-362, 167 (2000). 10.1016/S0040-6090(99)00778-6 (Pubitemid 30552383)
13. S. Chaisitsak, A. Yamada, and M. Konagai, Jpn. J. Appl. Phys., 41, 507 (2002). 10.1143/JJAP.41.507
14. R. Coehoorn, C. Haas, J. Dijkstra, and C. J. F. Flipse, Phys. Rev. B, 35, 6195 (1987). 10.1103/PhysRevB.35.6195