Atomic layer deposition of Al 2O 3 on V 2O 5 xerogel film for enhanced lithium-ion intercalation stability

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

  Liu, Dawei ^a,d   Liu, Yanyi ^a   Candelaria, Stephanie L ^a   Cao, Guozhong ^a   Liu, Jun ^b   Jeong, Yoon Ha ^c  

^a University of Washington   (United States)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^c Pohang University of Science and Technology (POSTECH)   (South Korea)

^d Brown University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE ELECTRODES; ATOMIC LAYER; CAPACITY DEGRADATION; CHARGE TRANSFER RESISTANCE; CYCLIC STABILITY; DEPOSITED FILMS; DIRECT CONTACT; DISCHARGE CAPACITIES; FLUORINE DOPED TIN OXIDE; INITIAL DISCHARGE CAPACITIES; LITHIUM IONS; MECHANICAL CONTACT; PHASE-ONLY; ROOM TEMPERATURE; XEROGEL FILMS;

ALUMINUM; ATOMIC LAYER DEPOSITION; ATOMIC SPECTROSCOPY; ATOMS; CHARGE TRANSFER; ELECTRIC DISCHARGES; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROLYTES; FLUORINE; IONS; LITHIUM; LITHIUM ALLOYS; NANOCOMPOSITES; OXIDE FILMS; SUBSTRATES; SURFACE CHEMISTRY; TIN; TIN OXIDES; XEROGELS;

VANADIUM;

EID: 84862951121     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3664115     Document Type: Article

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